LexDanaLexDanabeta
Inventor

Chinh Duc Tran

Inventor
Goettingen, DE

Overview

2→
Patents
2010
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
B82YSpecific uses or applications of nanostructures20%
G21KHandling of particles or ionising radiation not otherwise provided for20%
H05GX-ray technique20%
PatentTitleYear
7,755,070'Arrangement for the suppression of unwanted spectral components in a plasma-based EUV radiation source'20107,750,327'Device for the generation of a gas curtain for plasma-based EUV radiation sources'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010Patents assigned to XTREME TECH GMBH (2)· patent assignee history
2010Based in Goettingen, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
XTREME TECH GMBH22010
Locations
LocationPatentsSpan
Goettingen, DE22010