Inventor

Yong-Sun Ko

Inventor

Suwon-si, KR

Overview

1999–2020

Patent span

Electricity

Primary field (CPC H)

Patents· 53 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%

H10DInorganic electric semiconductor devices14%

H10BElectronic memory devices13%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1012%

H01LSemiconductor devices8%

C11DDetergent compositions6%

C09GPolishing compositions3%

H10NElectric solid-state devices not otherwise provided for3%

B08BCleaning in general3%

B24BMachines, devices, or processes for grinding or polishing2%

PatentTitleYear

10,818,522Process chamber for a supercritical process and apparatus for treating substrates having the same2020 10,795,263Compositions for removing photoresist2020 10,707,071Substrate processing apparatus and substrate processing system including the same2020 10,576,582Spot heater and device for cleaning wafer using the same2020 10,438,799Methods of fabricating semiconductor devices including support patterns2019 10,438,891Integrated circuit device2019 10,418,366Semiconductor devices including enlarged contact hole and methods of forming the same2019 10,029,332Spot heater and device for cleaning wafer using the same2018 10,025,192Methods of manufacturing semiconductor devices using a composition for removing photoresist and methods of removing photoresist from a semiconductor substrate2018 9,985,106Semiconductor devices utilizing spacer structures2018 9,903,651'Sealing member and substrate processing apparatus including the same'2018 9,394,509'Cleaning solution composition and method of cleaning semiconductor device using the same'2016 8,592,315'Chemical mechanical polishing method'2013 8,084,801'Cell structure for a semiconductor memory device and method of fabricating the same'2011 8,053,751'Phase-change semiconductor device and methods of manufacturing the same'2011 8,048,809'Polishing method using chemical mechanical slurry composition'2011 7,781,346'Methods of forming patterns and capacitors for semiconductor devices using the same'2010 7,745,341'Phase-change semiconductor device and methods of manufacturing the same'2010 7,713,879'Chemical mechanical polishing method'2010 7,709,319'Semiconductor device and method of manufacturing the same'2010 7,667,221'Phase change memory devices and methods for fabricating the same'2010 7,659,162'Phase change memory device and method of manufacturing the same'2010 7,589,013'Electrode structure and method of manufacturing the same, phase-change memory device having the electrode structure and method of manufacturing the same'2009 7,579,284'Etching solution, method of forming a pattern using the same, method of manufacturing a multiple gate oxide layer using the same and method of manufacturing a flash memory device using the same'2009 7,534,726'Method of forming a recess channel trench pattern, and fabricating a recess channel transistor'2009 7,534,704'Thin layer structure and method of forming the same'2009 7,498,253'Local interconnection method and structure for use in semiconductor device'2009 7,452,773'Method of manufacturing a flash memory device'2008 7,445,997'Methods of forming non-volatile memory devices having floating gate electrodes'2008 7,361,547'Method for forming a capacitor for use in a semiconductor device'2008 7,338,610'Etching method for manufacturing semiconductor device'2008 7,271,100'Slurry composition, polishing method using the slurry composition and method of forming a gate pattern using the slurry composition'2007 7,205,199'Method of forming a recess channel trench pattern, and fabricating a recess channel transistor'2007 7,202,163'Local interconnection method and structure for use in semiconductor device'2007 7,156,722'Platen structure of polishing apparatus for processing semiconductor wafer and method for exchanging polishing pad affixed to the same'2007 7,151,043'Method of manufacturing a semiconductor device'2006 7,144,301'Method and system for planarizing integrated circuit material'2006 7,105,474'Organic stripping composition and method of etching oxide using the same'2006 7,091,117'Method of fabricating a semiconductor device'2006 7,025,493'Chemical supply system and chemical mixing apparatus'2006 6,946,431'Cleaning solution including aqueous ammonia solution, acetic acid and deionized water for integrated circuit devices and methods of cleaning integrated circuit devices using the same'2005 6,889,447'Method for drying a wafer and apparatus for performing the same'2005 6,875,706'Cleaning solution and method of cleaning a semiconductor device using the same'2005 6,838,330'Method of forming a contact hole of a semiconductor device'2005 6,831,012'Method for forming a silicide film of a semiconductor device'2004 6,802,911'Method for cleaning damaged layers and polymer residue from semiconductor device'2004 6,638,855'Method of filling contact hole of semiconductor device'2003 6,399,552'Aqueous cleaning solution for removing contaminants surface of circuit substrate cleaning method using the same'2002 6,369,008'Cleaning solutions for removing contaminants from the surfaces of semiconductor substrates and cleaning methods using the same'2002 6,331,478'Methods for manufacturing semiconductor devices having chamfered metal silicide layers'2001 6,117,350'Adjustable selectivity etching solutions and methods of etching semiconductor devices using the same'2000 6,080,673'Chemical mechanical polishing methods utilizing pH-adjusted polishing solutions'2000 5,855,077'Apparatus for drying semiconductor wafers using isopropyl alcohol'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999–2020Patents assigned to SAMSUNG ELECTRONICS CO LTD (53)· patent assignee history

1999–2020Based in Suwon-si, KR· patent location history

2000–2009Based in Kyungki-do, KR· patent location history

2005–2010Based in Gyeonggi-do, KR· patent location history

2006Based in Yongin-si, KR· patent location history

2010Based in Plano, TX, US· patent location history

2011–2013Patents assigned to KO YONG-SUN (2)· patent assignee history

2011Patents assigned to BAE YONG-KUG (1)· patent assignee history

2011Patents assigned to BAEK KYOUNG-YUN (1)· patent assignee history

2018–2020Patents assigned to DONGWOO FINE CHEM (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SAMSUNG ELECTRONICS CO LTD	53	1999–2020
DONGWOO FINE CHEM	2	2018–2020
KO YONG-SUNself	2	2011–2013
BAE YONG-KUG	1	2011
BAEK KYOUNG-YUN	1	2011

Locations

Location	Patents	Span
Suwon-si, KR	37	1999–2020
Gyeonggi-do, KR	8	2005–2010
Kyungki-do, KR	6	2000–2009
Plano, Texas, US	1	2010
Yongin-si, KR	1	2006