Inventor
Yudai Tadaki
Inventor
Tsukuba, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material44%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
H01LSemiconductor devices22%
PatentTitleYear
9,683,288'Method of manufacturing semiconductor device and method of cleaning processing vessel'20179,540,727'Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus and recording medium'20178,679,259'Substrate processing apparatus, method of manufacturing semiconductor device and method of cleaning processing vessel'20148,308,871'Thermal cleaning gas production and supply system'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2017Patents assigned to AIR LIQUIDE (4)· patent assignee history
2012–2014Patents assigned to TADAKI YUDAI (2)· patent assignee history
2012–2014Based in Ibaraki, JP· patent location history
2014–2017Patents assigned to HITACHI INT ELECTRIC INC (3)· patent assignee history
2014Patents assigned to KAMEDA KENJI (1)· patent assignee history
2014Patents assigned to SONOBE JUN (1)· patent assignee history
2017Based in Tsukuba, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AIR LIQUIDE | 4 | 2012–2017 |
| HITACHI INT ELECTRIC INC | 3 | 2014–2017 |
| TADAKI YUDAIself | 2 | 2012–2014 |
| KAMEDA KENJI | 1 | 2014 |
| SONOBE JUN | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tsukuba, JP | 2 | 2017 |
| Ibaraki, JP | 2 | 2012–2014 |