LexDanaLexDanabeta
Inventor

Masaki Yanagisawa

Inventor
Yokohama, JP

Overview

46→
Patents
1992–2018
Patent span
Physics
Primary field (CPC G)

Patents· 46 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

A61Nprimary
A61NElectrotherapy23%
G21KHandling of particles or ionising radiation not otherwise provided for19%
B82YSpecific uses or applications of nanostructures10%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light10%
H10DInorganic electric semiconductor devices9%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
H05HPlasma technique4%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein3%
A61BDiagnosis2%
B29CShaping or joining of plastics2%
PatentTitleYear
10,128,633Surface emitting semiconductor laser20189,272,463'Mold for nano-imprinting, method for forming diffraction grating, and method for producing optical device including diffraction grating'20168,964,809'Semiconductor optical integrated device'20158,921,133'Method of forming a sampled grating and method of producing a laser diode'20148,827,685'Nano-imprint mold'20148,679,392'Process to form a mold of nanoimprint technique for making diffraction grating for DFB-LD'20148,636,498'Method for manufacturing nano-imprint mold, method for forming resin pattern by nano-imprint technique, and nano-imprint mold'20148,637,329'Method for producing semiconductor optical integrated device'20148,617,912'Method for manufacturing semiconductor laser'20138,563,342'Method of making semiconductor optical integrated device by alternately arranging spacers with integrated device arrays'20138,241,535'Method for transcribing patterns on resin body, method for manufacturing planar waveguide, and method for manufacturing micro-lens'20127,851,240'Method of forming diffraction grating and method of fabricating distributed feedback laser diode'20107,763,484'Method to form an optical grating and to form a distributed feedback laser diode with the optical grating'20107,667,812'Liquid crystal display apparatus comprising spacers'20107,589,334'Ion beam delivery equipment and an ion beam delivery method'20097,576,342'Ion beam delivery equipment and ion beam delivery method'20097,456,415'Charged particle beam extraction system and method'20087,449,701'Particle beam irradiation equipment and particle beam irradiation method'20087,394,082'Ion beam delivery equipment and an ion beam delivery method'20087,385,203'Charged particle beam extraction system and method'20087,355,189'Charged particle therapy system, range modulation wheel device, and method of installing range modulation wheel device'20087,297,967'Particle beam irradiation system and method of adjusting irradiation apparatus'20077,154,107'Particle beam irradiation system and method of adjusting irradiation field forming apparatus'20067,071,479'Particle beam irradiation system and method of adjusting irradiation apparatus'20067,053,389'Charged particle therapy system, range modulation wheel device, and method of installing range modulation wheel device'20067,049,613'Particle beam irradiation system and method of adjusting irradiation field forming apparatus'20067,038,254'Hetero-junction bipolar transistor having a transition layer between the base and the collector'20067,030,429'Hetero-junction bipolar transistor and the method for producing the same'20067,026,636'Particle beam irradiation system and method of adjusting irradiation apparatus'20066,992,312'Medical charged particle irradiation apparatus'20066,979,832'Medical charged particle irradiation apparatus'20056,953,943'Medical charged particle irradiation apparatus'20056,931,100'Multi-leaf collimator and medical system including accelerator'20056,885,042'Hetero-junction bipolar transistor and a manufacturing method of the same'20056,876,012'Hetero-bipolar transistor'20056,828,603'Hetero-bipolar transistor with a sub-collector layer having a first portion and plural second portions'20046,823,045'Multi-leaf collimator and medical system including accelerator'20046,819,743'Multi-leaf collimator and medical system including accelerator'20046,792,078'Multi-leaf collimator and medical system including accelerator'20046,784,064'Heterojunction bipolar transistor and method of making heterojunction bipolar transistor'20046,777,700'Particle beam irradiation system and method of adjusting irradiation apparatus'20046,664,610'Bipolar transistor and the method of manufacturing the same'20036,593,635'Light receiving semiconductor device with PIN structure'20036,531,722'Bipolar transistor'20035,329,387'Liquid crystal display device with display and compensation cells separated by distance larger than depth of focus of optical enlarger'19945,128,786'Liquid crystal display device having light shielding member with discontinous pattern'1992

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1992–2010Patents assigned to CASIO COMPUTER CO LTD (3)· patent assignee history
1992–2006Based in Tokyo, JP· patent location history
2003–2018Patents assigned to SUMITOMO ELECTRIC INDUSTRIES (22)· patent assignee history
2003–2018Based in Yokohama, JP· patent location history
2003–2004Based in Kanagawa, JP· patent location history
2004–2009Patents assigned to HITACHI LTD (21)· patent assignee history
2004–2009Based in Hitachi, JP· patent location history
2010Based in Higashiyamato, JP· patent location history
2012–2015Patents assigned to YANAGISAWA MASAKI (9)· patent assignee history
2013–2015Patents assigned to HIRATSUKA KENJI (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SUMITOMO ELECTRIC INDUSTRIES222003–2018
HITACHI LTD212004–2009
YANAGISAWA MASAKIself92012–2015
CASIO COMPUTER CO LTD31992–2010
HIRATSUKA KENJI32013–2015
Locations
LocationPatentsSpan
Yokohama, JP202003–2018
Hitachi, JP172004–2009
Tokyo, JP51992–2006
Kanagawa, JP22003–2004
Higashiyamato, JP12010