Inventor
Hendrik Walde
Inventor
Fort Collins, CO, US
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps36%
H05HPlasma technique21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
C23CCoating metallic material9%
H02MApparatus for conversion between ac and ac, between ac and dc, or between dc and dc, and for use with mains or similar power supply systems9%
Y02BClimate change mitigation technologies related to buildings, e.g. housing, house appliances or related end-user applications9%
G05FSystems for regulating electric or magnetic variables3%
PatentTitleYear
9,673,028'Arc management with voltage reversal and improved recovery'20179,558,917'Adjustable non-dissipative voltage boosting snubber network for achieving large boost voltages'20179,520,269'Adjustable non-dissipative voltage boosting snubber network for achieving large boost voltages'20169,313,870'Arc management with voltage reversal and improved recovery'20169,224,579'Adjustable non-dissipative voltage boosting snubber network for achieving large boost voltages'20159,150,960'Methods and apparatus for sputtering using direct current'20159,042,121'Power converter with preemptive protection'20158,552,665'Proactive arc management of a plasma load'20138,545,669'Sensor array for measuring plasma characteristics in plasma processing environments'20138,391,025'Preemptive protection for a power convertor'20138,133,359'Methods and apparatus for sputtering deposition using direct current'20128,044,594'Power supply ignition system and method'20117,791,912'Protection method, system and apparatus for a power converter'20106,902,646'Sensor array for measuring plasma characteristics in plasma processing environments'20056,876,205'Stored energy arc detection and arc reduction circuit'20056,132,563'Reactive sputtering process'20006,005,218'Process and circuit for the bipolar pulse-shaped feeding of energy into low-pressure plasmas'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2017Based in Fort Collins, CO, US· patent location history
2000Based in Dresden, DE· patent location history
2005–2017Patents assigned to ADVANCED ENERGY IND INC (14)· patent assignee history
2012–2015Patents assigned to WALDE HENDRIK V (3)· patent assignee history
2012–2015Patents assigned to CHRISTIE DAVID J (2)· patent assignee history
2012–2015Patents assigned to FRIES BRUCE (2)· patent assignee history
2012–2015Patents assigned to NAUMAN KEN (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ADVANCED ENERGY IND INC | 14 | 2005–2017 |
| WALDE HENDRIK Vself | 3 | 2012–2015 |
| CHRISTIE DAVID J | 2 | 2012–2015 |
| FRIES BRUCE | 2 | 2012–2015 |
| NAUMAN KEN | 2 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fort Collins, CO, US | 16 | 1999–2017 |
| Dresden, DE | 1 | 2000 |