Inventor

Alexander Arthur HIGH

Inventor

Overview

2→

Patents

2022–2023

Patent span

Physics

Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary

C23CCoating metallic material20%

G02BOptical elements, systems or apparatus20%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%

H01LSemiconductor devices20%

H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation20%

PatentTitleYear

11,815,668Atomic layer deposition process for fabricating dielectric metasurfaces for wavelengths in the visible spectrum2023 11,366,296Atomic layer deposition process for fabricating dielectric metasurfaces for wavelengths in the visible spectrum2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2023Patents assigned to CHARLES STARK DRAPER LABORATORY INC (2)· patent assignee history

2022–2023Patents assigned to HARVARD COLLEGE (2)· patent assignee history

2022–2023Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
CHARLES STARK DRAPER LABORATORY INC	2	2022–2023
HARVARD COLLEGE	2	2022–2023

Locations

Location	Patents	Span
US	2	2022–2023