Inventor
Shoji Seta
Inventor
Yokohama, JP
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Wprimary
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1037%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
H01LSemiconductor devices9%
G06FElectric digital data processing6%
H10DInorganic electric semiconductor devices6%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation6%
G09GArrangements or circuits for control of indicating devices using static means to present variable information3%
H03KPulse technique3%
H04NPictorial communication, e.g. television3%
PatentTitleYear
9,191,637'Solid-state imaging apparatus'20159,041,134'Solid-state imaging device'20158,878,371'Semiconductor device'20148,653,629'Semiconductor device and wafer'20148,450,855'Semiconductor device'20138,269,346'Semiconductor device and method of designing a wiring of a semiconductor device'20127,961,359'Semiconductor device and display device'20117,719,115'Semiconductor integrated circuit including a multi-level interconnect with a diagonal wire'20107,652,920'Semiconductor integrated circuit device'20107,370,307'Computer automated design system, a computer automated design method, and a semiconductor integrated circuit'20087,169,697'Semiconductor device and manufacturing method of the same'20076,987,066'Dry etching method and semiconductor device manufacturing method'20066,849,923'Semiconductor device and manufacturing method of the same'20056,846,750'High precision pattern forming method of manufacturing a semiconductor device'20056,627,557'Semiconductor device and method for manufacturing the same'20036,607,986'Dry etching method and semiconductor device manufacturing method'20036,605,542'Manufacturing method of semiconductor devices by using dry etching technology'20036,492,278'Method of manufacturing semiconductor device'20026,352,931'Manufacturing method of semiconductor devices by using dry etching technology'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2015Patents assigned to TOSHIBA KK (19)· patent assignee history
2002–2010Based in Yokohama, JP· patent location history
2010–2015Based in Tokyo, JP· patent location history
2012–2014Patents assigned to SETA SHOJI (3)· patent assignee history
2012–2013Patents assigned to IKUMA HIDEAKI (2)· patent assignee history
2012Patents assigned to OOWAKI YUKIHITO (1)· patent assignee history
2014Patents assigned to HAMASAKI YOJIRO (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOSHIBA KK | 19 | 2002–2015 |
| SETA SHOJIself | 3 | 2012–2014 |
| IKUMA HIDEAKI | 2 | 2012–2013 |
| HAMASAKI YOJIRO | 1 | 2014 |
| OOWAKI YUKIHITO | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 11 | 2002–2010 |
| Tokyo, JP | 8 | 2010–2015 |