Inventor
Kazuki Noda
Inventor
Tokyo, JP
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form12%
B41MPrinting, duplicating, marking, or copying processes10%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein10%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
Y10TTechnical subjects covered by former us classification7%
G02BOptical elements, systems or apparatus5%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy5%
A63FCard, board, or roulette games2%
B24BMachines, devices, or processes for grinding or polishing2%
PatentTitleYear
11,063,284Membrane electrode assembly and solid polymer fuel cell202110,525,352Game processing method and recording medium202010,451,401Displacement detecting device with controlled heat generation20199,843,247'Rotating electric machine'20179,478,818'Gas diffusion layer and membrane electrode assembly including gas diffusion layer, and method of regenerating membrane electrode assembly'20168,800,631'Laminate body, method, and apparatus for manufacturing ultrathin substrate using the laminate body'20148,789,569'Apparatus for manufacturing ultrathin substrate using a laminate body'20148,349,706'Semiconductor surface protecting method'20138,038,839'Laminate body, method, and apparatus for manufacturing ultrathin substrate using the laminate body'20117,988,807'Laminate body, method, and apparatus for manufacturing ultrathin substrate using the laminate body'20117,534,498'Laminate body, method, and apparatus for manufacturing ultrathin substrate using the laminate body'20097,452,752'Production method of semiconductor chip'20086,783,915'Thermal transfer of a black matrix containing carbon black'20046,617,093'Thermal transfer of a black matrix containing carbon black'20036,461,775'Thermal transfer of a black matrix containing carbon black'20026,221,543'Process for making active substrates for color displays'20015,268,521'Catalyst for selective hydrogenation reaction'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–2021Based in Tokyo, JP· patent location history
2001–2021Patents assigned to 3M INNOVATIVE PROPERTIES CO (12)· patent assignee history
2001–2013Based in Sagamihara, JP· patent location history
2002–2004Based in Kariya, Aichi-pref., JP· patent location history
2013–2017Patents assigned to NODA KAZUKI (4)· patent assignee history
2013Patents assigned to 3M INNOVTIVE PROPERTIES COMPANY (1)· patent assignee history
2014Patents assigned to IWASAWA MASARU (2)· patent assignee history
2019Patents assigned to DMG MORI CO LTD (1)· patent assignee history
2019Based in Isehara, JP· patent location history
2020Based in Yokohama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| 3M INNOVATIVE PROPERTIES CO | 12 | 2001–2021 |
| NODA KAZUKIself | 4 | 2013–2017 |
| IWASAWA MASARU | 2 | 2014 |
| 3M INNOVTIVE PROPERTIES COMPANY | 1 | 2013 |
| DMG MORI CO LTD | 1 | 2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 8 | 1993–2021 |
| Sagamihara, JP | 3 | 2001–2013 |
| Kariya, Aichi-pref., JP | 3 | 2002–2004 |
| Yokohama, JP | 1 | 2020 |
| Isehara, JP | 1 | 2019 |