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Inventor

Kazuhiro Hamamoto

Inventor
Tokyo, JP

Overview

1→
Patents
2021
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
PatentTitleYear
10,996,554Substrate with an electrically conductive film, substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021Patents assigned to HOYA CORP (1)· patent assignee history
2021Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HOYA CORP12021
Locations
LocationPatentsSpan
Tokyo, JP12021