Inventor
Hanshen Zhang
Inventor
Cupertino, CA, US
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices28%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1028%
H01JElectric discharge tubes or discharge lamps24%
H10BElectronic memory devices10%
H10DInorganic electric semiconductor devices7%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
PatentTitleYear
10,861,676Metal recess for semiconductor structures202010,854,426Metal recess for semiconductor structures202010,692,8803D NAND high aspect ratio structure etch20209,960,049Two-step fluorine radical etch of hafnium oxide20189,881,805'Silicon selective removal'20189,564,338'Silicon-selective removal'20179,472,412'Procedure for etch rate consistency'20169,245,762'Procedure for etch rate consistency'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2020Patents assigned to APPLIED MATERIALS INC (8)· patent assignee history
2016–2020Based in Cupertino, CA, US· patent location history
2020Based in Santa Clara, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 8 | 2016–2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Cupertino, California, US | 7 | 2016–2020 |
| Santa Clara, California, US | 1 | 2020 |