Inventor
Jung Gun Heo
Inventor
Daejeon, KR
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
H01LSemiconductor devices18%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
H10DInorganic electric semiconductor devices8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
C08LCompositions of macromolecular compounds5%
H10BElectronic memory devices5%
Y10TTechnical subjects covered by former us classification5%
C09DCoating compositions, e.g. paints, varnishes or lacquers3%
PatentTitleYear
10,988,604Method of preparing diene-based rubber latex, method of preparing ABS-based graft copolymer and method of manufacturing injection-molded article202110,504,726Nano-scale structures20199,911,605'Methods of forming fine patterns'20189,691,614'Methods of forming different sized patterns'20179,666,448'Methods of forming patterns'20179,640,399'Methods of forming patterns with block copolymer'20179,523,917'Methods of forming patterns'20169,449,840'Methods of forming different sized patterns'20169,354,519'Methods of forming patterns'20169,218,984'Method for manufacturing a semiconductor device'20159,165,769'Fine pattern structures having block co-polymer materials'20159,082,718'Fine pattern structures having block co-polymer materials'20158,962,491'Methods of fabricating semiconductor devices and semiconductor devices fabricated thereby'20158,685,627'Method for manufacturing a semiconductor device'20147,994,050'Method for forming dual damascene pattern'20117,964,510'Method for forming pattern of a semiconductor device'20117,811,929'Method for forming dual damascene pattern'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010–2014Patents assigned to HYNIX SEMICONDUCTOR INC (4)· patent assignee history
2010–2019Based in Icheon-si, KR· patent location history
2014Patents assigned to BAN KEUM DO (1)· patent assignee history
2014Patents assigned to BOK CHEOL KYU (1)· patent assignee history
2014Patents assigned to HEO JUNG GUN (1)· patent assignee history
2014Based in Gyeonggi-do, KR· patent location history
2015–2019Patents assigned to SK HYNIX INC (12)· patent assignee history
2016–2021Based in Daejeon, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SK HYNIX INC | 12 | 2015–2019 |
| HYNIX SEMICONDUCTOR INC | 4 | 2010–2014 |
| BAN KEUM DO | 1 | 2014 |
| BOK CHEOL KYU | 1 | 2014 |
| HEO JUNG GUNself | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Daejeon, KR | 8 | 2016–2021 |
| Icheon-si, KR | 8 | 2010–2019 |
| Gyeonggi-do, KR | 1 | 2014 |