Inventor

Son Nguyen Kim

Inventor
Hemsbach, DE

Overview

37→
Patents
1992–2014
Patent span
Human necessities
Primary field (CPC A)

Patents· 37 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

A61Kprimary
A61KPreparations for medical, dental or toiletry purposes27%
A61QSpecific use of cosmetics or similar toiletry preparations26%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds18%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds8%
C08LCompositions of macromolecular compounds5%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations2%
C05GMixtures of fertilisers covered individually by different subclasses of class c051%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients1%
PatentTitleYear
8,673,275'Block copolymers and their use'20148,398,963'Cosmetic agent'20138,303,943'Ampholytic copolymer based on quaternized nitrogen-containing monomers'20128,247,507'Cationic polymers as thickeners for aqueous and alcoholic compositions'20128,084,561'Process for preparing acrylate copolymers'2011RE041615'Crosslinked, water-soluble or water-dispersible polyurethanes'2010RE039936'Crosslinked, water-soluble or water-dispersible polyurethanes'20077,019,061'Polyurethane and the use thereof for modifying rheological properties'20066,992,161'Water-soluble or water-dispersible graft polymers, their preparation and use'20066,932,964'Cosmetic composition with water-soluble or water-dispersible polymers'20056,864,330'Use of hydrophilic graft copolymers containing N-vinylamine and/or open-chain N-vinylamide units in cosmetic formulations'20056,800,276'Polyureas and water-soluble or water-dispersible polymeric salts'20046,737,049'Cationic polymers and their use'20046,579,517'Cosmetic product'20036,524,564'Urethane(meth)acrylates containing siloxane groups and able to undergo free-radical polymerization'20036,489,397'Crosslinked, water-soluble or water-dispersible polyurethanes'20026,413,292'Use of an aqueous dispersion from a biodegradable polyester as a sheathing material for granulated fertilizer'20026,410,004'Polyureas and water-soluble or water-dispersible polymeric salts'20026,407,158'Water-soluble or water-dispersible polymeric salts'20026,372,876'Use of polyurethanes which are soluble or dispersible in water as aids in cosmetic and pharmaceutical compositions, and polyurethanes which contain polylactic acid polyols as copolymerized units'20026,368,583'Hair treatment composition'20026,365,697'Water-soluble or water-dispersible polyurethanes with terminal acid groups, the production and the use thereof'20026,335,003'Use of cationic polyurethanes and polyureas as ingredients of cosmetic preparations'20026,329,472'Water-soluble or water-dispersible graft copolymers based on a polyvinyllactam, their preparation and use'20016,277,386'Cosmetic'20016,262,176'Crosslinked water-soluble or water-dispersible polyurethanes'20016,123,963'Use of water-soluble or water-dispersible polyurethanes as coatings or binders for pharmaceutical presentations'20006,103,858'Aqueous dispersion of a biodegradable polyester and its use thereof'20006,051,370'Radiation-sensitive mixture'20005,961,965'Water-soluble or water-dispersible polyaspartic acid derivatives their preparation and their use'19995,925,728'Water-soluble or water-dispersible polyaspartic acid derivatives, their preparation and their use'19995,880,252'Pyrrolidonyl-containing polyesters and polyamides'19995,498,690'Use of polycondensation products, and novel polycondensation products'19965,389,494'Radiation-sensitive mixture and production of relief images'19955,204,216'Radiation-sensitive mixture'19935,151,341'Radiation-sensitive mixture and production of relief structures'19925,110,708'Radiation-sensitive mixture and production of relief images'1992

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1992–2007Patents assigned to BASF AG (30)· patent assignee history
1992–2014Based in Hemsbach, DE· patent location history
2002Based in Hernsbach, DE· patent location history
2010–2014Patents assigned to BASF SE (6)· patent assignee history
2011–2014Patents assigned to KIM SON NGUYEN (5)· patent assignee history
2011–2012Patents assigned to LAUBENDER MATTHIAS (2)· patent assignee history
2012–2014Patents assigned to JAHNEL WOLFGANG (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
BASF AG301992–2007
BASF SE62010–2014
KIM SON NGUYENself52011–2014
JAHNEL WOLFGANG22012–2014
LAUBENDER MATTHIAS22011–2012
Locations
LocationPatentsSpan
Hemsbach, DE361992–2014
Hernsbach, DE12002