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Inventor

Jun Yu

Inventor
New Taipei, TW

Overview

2→
Patents
2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
B22FWorking metallic powder14%
C22CAlloys14%
C22FChanging the physical structure of non-ferrous metals and non-ferrous alloys14%
C25DProcesses for the electrolytic or electrophoretic production of coatings14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
PatentTitleYear
11,003,089Method and apparatus for dynamic lithographic exposure202110,948,816Pellicle frame and pellicle2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021Patents assigned to NIPPON LIGHT METAL CO (1)· patent assignee history
2021Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (1)· patent assignee history
2021Based in New Taipei, TW· patent location history
2021Based in Shizuoka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NIPPON LIGHT METAL CO12021
TAIWAN SEMICONDUCTOR MFG CO LTD12021
Locations
LocationPatentsSpan
New Taipei, TW12021
Shizuoka, JP12021