Inventor
Akira Yoshio
Inventor
Tokyo, JP
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1021%
B24BMachines, devices, or processes for grinding or polishing14%
C23CCoating metallic material7%
C25FProcesses for the electrolytic removal of materials from objects7%
B23HWorking of metal by the action of a high concentration of electric current on a workpiece using an electrode which takes the place of a tool5%
C25DProcesses for the electrolytic or electrophoretic production of coatings5%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
H05KPrinted circuits5%
B05CApparatus for applying fluent materials to surfaces, in general2%
PatentTitleYear
7,232,760'Method for producing semiconductor device, polishing apparatus, and polishing method'20077,186,322'Methods of producing and polishing semiconductor device and polishing apparatus'20076,855,634'Polishing method and polishing apparatus'20056,808,617'Electrolytic polishing method'20046,797,623'Methods of producing and polishing semiconductor device and polishing apparatus'20046,693,036'Method for producing semiconductor device polishing apparatus, and polishing method'20046,638,564'Method of electroless plating and electroless plating apparatus'20036,555,158'Method and apparatus for plating, and plating structure'20036,534,117'Electroless plating method and electroless plating solution'20036,380,065'Interconnection structure and fabrication process therefor'20025,778,911'Liquid supplying apparatus'19985,591,264'Spin coating device'19974,387,356'Circuit breaker'19834,188,240'Method for producing a metal layer by plating'1980Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1980–2007Patents assigned to SONY CORP (12)· patent assignee history
1980–2007Based in Tokyo, JP· patent location history
1983Patents assigned to MATSUSHITA ELECTRIC WORKS LTD (1)· patent assignee history
1983Based in Osaka, JP· patent location history
1997–1998Based in Shizuoka, JP· patent location history
1998Patents assigned to SONY DISC TECHNOLOGY INC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SONY CORP | 12 | 1980–2007 |
| MATSUSHITA ELECTRIC WORKS LTD | 1 | 1983 |
| SONY DISC TECHNOLOGY INC | 1 | 1998 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 11 | 1980–2007 |
| Shizuoka, JP | 2 | 1997–1998 |
| Osaka, JP | 1 | 1983 |