Inventor
Purushottam Kumar
Inventor
Hillsboro, OR, US
Overview
Patents· 30 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
H01LSemiconductor devices21%
C23CCoating metallic material20%
H01JElectric discharge tubes or discharge lamps14%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
B60WConjoint control of vehicle sub-units of different type or different function1%
E05FDevices for moving wings into open or closed position1%
E05YIndexing scheme associated with subclasses e05d and e05f, relating to construction elements, electric control, power supply, power signal or transmission, user interfaces, mounting or coupling, details, accessories, auxiliary operations not otherwise provided for, application thereof1%
G06KGraphical data reading1%
PatentTitleYear
11,125,003System and method for closing a door of a vehicle202110,847,352Compensating chamber and process effects to improve critical dimension variation for trim process202010,832,909Atomic layer etch, reactive precursors and energetic sources for patterning applications202010,727,143Method for controlling core critical dimension variation using flash trim sequence202010,727,046Surface modified depth controlled deposition for plasma based deposition202010,679,848Selective atomic layer deposition with post-dose treatment202010,658,172Dielectric gapfill of high aspect ratio features utilizing a sacrificial etch cap layer202010,655,224Conical wafer centering and holding device for semiconductor processing202010,636,686Method monitoring chamber drift202010,566,187Ultrathin atomic layer deposition film accuracy thickness control202010,526,700Hardware and process for film uniformity improvement202010,526,701Multi-cycle ALD process for film uniformity and thickness profile modulation202010,494,715Atomic layer clean for removal of photoresist patterning scum201910,431,451Methods and apparatuses for increasing reactor processing batch size201910,407,773Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system201910,351,953Systems and methods for flow monitoring in a precursor vapor supply system of a substrate processing system201910,311,723Parking management system and method201910,269,559Dielectric gapfill of high aspect ratio features utilizing a sacrificial etch cap layer201910,224,235Systems and methods for creating airgap seals using atomic layer deposition and high density plasma chemical vapor deposition201910,100,407Hardware and process for film uniformity improvement201810,094,018Dynamic precursor dosing for atomic layer deposition201810,074,543High dry etch rate materials for semiconductor patterning applications201810,062,563Selective atomic layer deposition with post-dose treatment201810,037,884Selective atomic layer deposition for gapfill using sacrificial underlayer20189,997,371Atomic layer etch methods and hardware for patterning applications20189,970,108Systems and methods for vapor delivery in a substrate processing system20189,870,917'Variable temperature hardware and methods for reduction of wafer backside deposition'20189,624,578'Method for RF compensation in plasma assisted atomic layer deposition'20179,617,638'Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system'20177,932,534'High light extraction efficiency solid state light sources'2011Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2011Patents assigned to SINMAT INC (1)· patent assignee history
2011Patents assigned to UNIV FLORIDA (1)· patent assignee history
2011Based in Gainesville, FL, US· patent location history
2017–2020Patents assigned to LAM RES CORP (27)· patent assignee history
2017–2020Based in Hillsboro, OR, US· patent location history
2019Patents assigned to INTEL CORP (1)· patent assignee history
2019Based in Chandler, AZ, US· patent location history
2021Patents assigned to FARADAY&FUTURE INC (1)· patent assignee history
2021Based in Fremont, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 27 | 2017–2020 |
| FARADAY&FUTURE INC | 1 | 2021 |
| INTEL CORP | 1 | 2019 |
| SINMAT INC | 1 | 2011 |
| UNIV FLORIDA | 1 | 2011 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hillsboro, OR, US | 27 | 2017–2020 |
| Fremont, California, US | 1 | 2021 |
| Chandler, AZ, US | 1 | 2019 |
| Gainesville, Florida, US | 1 | 2011 |