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Inventor

Kazuhiro Tomioka

Inventor
Seoul, KR

Overview

33→
Patents
1994–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 33 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary
H01LSemiconductor devices19%
H10NElectric solid-state devices not otherwise provided for19%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
H10BElectronic memory devices16%
H10DInorganic electric semiconductor devices11%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
H01JElectric discharge tubes or discharge lamps5%
C23CCoating metallic material2%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices1%
G11CStatic stores1%
PatentTitleYear
10,847,576Magnetic memory device and manufacturing method thereof202010,490,732Magnetic memory device with sidewall layer containing boron and manufacturing method thereof201910,461,245Magnetic memory device and method of manufacturing the same201910,381,198Plasma processing apparatus and plasma processing method201910,230,042Magnetoresistive element and method of manufacturing the same201910,193,057Magnetic memory device20199,698,338'Magnetic memory device and method of manufacturing magnetic memory device'20179,595,663'Magnetic memory having magnetoresistive element and method of manufacturing magnetoresistive element'20179,570,671'Magnetic memory device'20179,508,922'Magnetic memory device and method of manufacturing the same'20169,425,388'Magnetic element and method of manufacturing the same'20169,287,495'Method of manufacturing semiconductor device'20169,093,632'Nonvolatile semiconductor memory device and method of manufacturing the same'20158,987,007'Method of manufacturing a semiconductor device having a magnetic film using plasma etching'20158,956,882'Method of manufacturing magnetoresistive element'20158,586,390'Method for manufacturing semiconductor device'20138,187,981'Substrate processing method, substrate processing system, and computer-readable storage medium'20127,855,141'Semiconductor device having multiple wiring layers and method of producing the same'20107,767,582'Method of manufacturing semiconductor device'20107,745,326'Semiconductor device having multiple wiring layers and method of producing the same'20107,589,014'Semiconductor device having multiple wiring layers and method of producing the same'20097,504,680'Semiconductor device and mask pattern'20097,400,005'Semiconductor memory device having ferroelectric capacitors with hydrogen barriers'20087,115,522'Method for manufacturing semiconductor device'20067,045,837'Hardmask with high selectivity for Ir barriers for ferroelectric capacitor manufacturing'20067,042,705'Sidewall structure and method of fabrication for reducing oxygen diffusion to contact plugs during CW hole reactive ion etch processing'20067,015,049'Fence-free etching of iridium barrier having a steep taper angle'20066,780,278'Plasma processing apparatus with reduced parasitic capacity and loss in RF power'20046,762,064'Process for fabrication of a ferrocapacitor'20045,897,713'Plasma generating apparatus'19995,810,963'Plasma processing apparatus and method'19985,445,710'Method of manufacturing semiconductor device'19955,302,240'Method of manufacturing semiconductor device'1994

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1994–2017Patents assigned to TOSHIBA KK (23)· patent assignee history
1994–2012Based in Tokyo, JP· patent location history
2004–2006Based in Kanagawa, JP· patent location history
2006–2019Based in Yokohama, JP· patent location history
2008–2009Based in Tsukuba, JP· patent location history
2012–2017Patents assigned to TOMIOKA KAZUHIRO (9)· patent assignee history
2015–2017Patents assigned to SETO SATOSHI (7)· patent assignee history
2015–2017Patents assigned to YOSHIKAWA MASATOSHI (7)· patent assignee history
2015–2020Based in Seoul, KR· patent location history
2019–2020Patents assigned to TOSHIBA MEMORY CORP (6)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOSHIBA KK231994–2017
TOMIOKA KAZUHIROself92012–2017
SETO SATOSHI72015–2017
YOSHIKAWA MASATOSHI72015–2017
TOSHIBA MEMORY CORP62019–2020
Locations
LocationPatentsSpan
Seoul, KR122015–2020
Yokohama, JP92006–2019
Tokyo, JP61994–2012
Kanagawa, JP42004–2006
Tsukuba, JP22008–2009