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Inventor

MASAYOSHI FURUKAWA

Inventor
JP

Overview

1→
Patents
2025
Patent span
Chemistry
Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Dprimary
C07DHeterocyclic compounds25%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds25%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
Y02PClimate change mitigation technologies in the production or processing of goods25%
PatentTitleYear
12,498,638Monomer, resin for photoresist, resin composition for photoresist, and pattern forming method2025

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2025Patents assigned to DAICEL CORP (1)· patent assignee history
2025Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
DAICEL CORP12025
Locations
LocationPatentsSpan
JP12025