Inventor
Shinya Komatsu
Inventor
Nagano, JP
Overview
Patents· 26 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B41Jprimary
B41JTypewriters58%
H05KPrinted circuits11%
Y10TTechnical subjects covered by former us classification11%
B23BTurning8%
G01NInvestigating or analysing materials by determining their chemical or physical properties5%
B05BSpraying apparatus3%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling3%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form3%
PatentTitleYear
9,701,125'Printing apparatus and maintenance method for printing apparatus'20179,399,353'Liquid discharge apparatus and liquid supply path state detection method'20169,259,918'Liquid discharge apparatus and liquid discharge state detecting method'20169,254,700'Liquid discharge device, and discharge abnormality testing method'20169,211,592'Lubricant sheet for drilling and method of drilling'20158,777,366'Liquid-discharging device, and method for substituting liquid'20148,646,867'Liquid-discharging device, inspection method of liquid-discharging device, and program'20148,408,670'Discharge inspection apparatus and discharge inspection method'20138,360,543'Liquid ejecting apparatus and ejection inspecting method'20138,177,315'Printing apparatus and method of controlling the same'20128,033,634'Liquid discharging apparatus, method of controlling the same, and program that implements the method'20117,980,653'Ejection inspecting device, printing device, and ejection inspecting method'20117,950,761'Liquid discharging apparatus and method for obtaining a large liquid droplet detection signal'20117,651,189'Liquid-ejection testing method, liquid-ejection testing device, and computer-readable medium'20107,645,007'Ink jet recording apparatus, nozzle inspection method and program thereof'20107,641,934'Process for the production of entry sheet for drilling and use thereof'20107,568,780'Liquid ejection inspecting apparatus, liquid ejection inspecting method, printing apparatus, computer-readable storage medium, and liquid ejection system for inspecting whether or not liquid is ejected from a liquid ejection nozzle normally'20097,503,637'Liquid-ejection testing method, liquid-ejection testing device, and computer-readable medium'20097,497,547'Nozzle cleaning method, nozzle cleaning device, liquid ejection apparatus, printing apparatus and computer-readable medium'20097,318,636'Method for forming correction pattern, liquid ejecting apparatus, and correction pattern'20087,198,349'Method for testing ejection, printing apparatus, method for forming ejection-test pattern, ejection-test pattern, computer-readable medium, and printing system'20077,134,328'Liquid-ejection testing method, liquid-ejection testing device, and computer-readable medium'20067,101,017'Method for testing ejection, printing apparatus, method for forming ejection-test pattern, ejection-test pattern, computer-readable medium, and printing system'20067,066,568'Determining method for determining whether ink was ejected or not, computer-readable medium, and printing apparatus'20066,866,450'Entry sheet for drilling and method for drilling hole'20056,753,300'Lubricant sheet for making hole and method of making hole with drill'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2015Patents assigned to MITSUBISHI GAS CHEMICAL CO (4)· patent assignee history
2004–2015Based in Tokyo, JP· patent location history
2006–2017Patents assigned to SEIKO EPSON CORP (22)· patent assignee history
2006–2016Based in Nagano, JP· patent location history
2011–2017Based in Shiojiri, JP· patent location history
2012–2015Patents assigned to KOMATSU SHINYA (5)· patent assignee history
2012Patents assigned to ENDO HIRONORI (1)· patent assignee history
2015Patents assigned to EJIRI MITSUO (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SEIKO EPSON CORP | 22 | 2006–2017 |
| KOMATSU SHINYAself | 5 | 2012–2015 |
| MITSUBISHI GAS CHEMICAL CO | 4 | 2004–2015 |
| EJIRI MITSUO | 1 | 2015 |
| ENDO HIRONORI | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nagano, JP | 17 | 2006–2016 |
| Shiojiri, JP | 5 | 2011–2017 |
| Tokyo, JP | 4 | 2004–2015 |