Inventor
Peter Wai-Man Lee
Inventor
San Jose, CA, US
Overview
Patents· 29 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
B05DProcesses for applying fluent materials to surfaces, in general6%
H01JElectric discharge tubes or discharge lamps5%
Y10TTechnical subjects covered by former us classification3%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds2%
B82BNanostructures formed by manipulation of individual atoms, molecules, or limited collections of atoms or molecules as discrete units1%
C08JWorking-up1%
PatentTitleYear
7,745,328'Low dielectric (low k) barrier films with oxygen doping by plasma-enhanced chemical vapor deposition (PECVD)'20107,465,659'Low dielectric (low k) barrier films with oxygen doping by plasma-enhanced chemical vapor deposition (PECVD)'20087,459,404'Adhesion improvement for low k dielectrics'20087,157,384'Low dielectric (low k) barrier films with oxygen doping by plasma-enhanced chemical vapor deposition (PECVD)'20077,153,787'CVD plasma assisted lower dielectric constant SICOH film'20067,030,041'Adhesion improvement for low k dielectrics'20067,024,105'Substrate heater assembly'20067,008,484'Method and apparatus for deposition of low dielectric constant materials'20066,943,127'CVD plasma assisted lower dielectric constant SICOH film'20056,911,403'Methods of reducing plasma-induced damage for advanced plasma CVD dielectrics'20056,838,393'Method for producing semiconductor including forming a layer containing at least silicon carbide and forming a second layer containing at least silicon oxygen carbide'20056,709,715'Plasma enhanced chemical vapor deposition of copolymer of parylene N and comonomers with various double bonds'20046,663,713'Method and apparatus for forming a thin polymer layer on an integrated circuit structure'20036,523,494'Apparatus for depositing low dielectric constant oxide film'20036,486,082'CVD plasma assisted lower dielectric constant sicoh film'20026,374,770'Apparatus for improving film stability of halogen-doped silicon oxide films'20026,319,324'Method and apparatus for elimination of TEOS/ozone silicon oxide surface sensitivity'20016,153,540'Method of forming phosphosilicate glass having a high wet-etch rate'20006,149,987'Method for depositing low dielectric constant oxide films'20006,149,974'Method for elimination of TEOS/ozone silicon oxide surface sensitivity'20006,121,164'Method for forming low compressive stress fluorinated ozone/TEOS oxide film'20006,107,184'Nano-porous copolymer films having low dielectric constants'20006,103,601'Method and apparatus for improving film stability of halogen-doped silicon oxide films'20006,086,952'Chemical vapor deposition of a copolymer of p-xylylene and a multivinyl silicon/oxygen comonomer'20005,958,510'Method and apparatus for forming a thin polymer layer on an integrated circuit structure'19995,792,269'Gas distribution for CVD systems'19985,354,387'Boron phosphorus silicate glass composite layer on semiconductor wafer'19945,314,845'Two step process for forming void-free oxide layer over stepped surface of semiconductor wafer'19945,166,101'Method for forming a boron phosphorus silicate glass composite layer on a semiconductor wafer'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1992–2010Patents assigned to APPLIED MATERIALS INC (29)· patent assignee history
1992–2003Based in Fremont, CA, US· patent location history
2000–2010Based in San Jose, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 29 | 1992–2010 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 17 | 2000–2010 |
| Fremont, California, US | 12 | 1992–2003 |