Inventor
Kaori Kirikihira
Inventor
Toyama, JP
Overview
Patents· 2 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material25%
H01LSemiconductor devices25%
H10DInorganic electric semiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
PatentTitleYear
9,899,211'Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium'20188,987,146'Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus and non-transitory computer-readable recording medium'2015Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2015–2018Patents assigned to HITACHI INT ELECTRIC INC (2)· patent assignee history
2015–2018Based in Toyama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI INT ELECTRIC INC | 2 | 2015–2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyama, JP | 2 | 2015–2018 |