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Inventor

Robert Allen David

Inventor
San Jose, CA, US

Overview

2→
Patents
2009–2015
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
8,945,808'Self-topcoating resist for photolithography'20157,521,172'Topcoat material and use thereof in immersion lithography processes'2009

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2009–2015Patents assigned to IBM (2)· patent assignee history
2009–2015Based in San Jose, CA, US· patent location history
2015Patents assigned to BROCK PHILLIP JOE (1)· patent assignee history
2015Patents assigned to DAVID ROBERT ALLEN (1)· patent assignee history
2015Patents assigned to LARSON CARL E (1)· patent assignee history
2015Patents assigned to SANDERS DANIEL PAUL (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM22009–2015
BROCK PHILLIP JOE12015
DAVID ROBERT ALLENself12015
LARSON CARL E12015
SANDERS DANIEL PAUL12015
Locations
LocationPatentsSpan
San Jose, California, US22009–2015