LexDanaLexDanabeta
Inventor

Gary P. Viens

Inventor
Colchester, VT, US

Overview

3→
Patents
1993–2001
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
B05CApparatus for applying fluent materials to surfaces, in general17%
C11DDetergent compositions17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
PatentTitleYear
6,319,884'Method for removal of cured polyimide and other polymers'20016,068,881'Spin-apply tool having exhaust ring'20005,219,788'Bilayer metallization cap for photolithography'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–2001Patents assigned to IBM (3)· patent assignee history
1993–2001Based in Colchester, VT, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM31993–2001
Locations
LocationPatentsSpan
Colchester, VT, US31993–2001