Inventor
Masatsugu Shigeno
Inventor
Chiba, JP
Overview
Patents· 25 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Qprimary
G01QScanning-probe techniques or apparatus49%
B82YSpecific uses or applications of nanostructures20%
G01BMeasuring length, thickness or similar linear dimensions6%
G01NInvestigating or analysing materials by determining their chemical or physical properties4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering2%
C12MApparatus for enzymology or microbiology2%
F21KNon-electric light sources using luminescence2%
G01GWeighing2%
G01HMeasurement of mechanical vibrations or ultrasonic, sonic or infrasonic waves2%
PatentTitleYear
10,837,982Scanning probe microscope and scanning method using the same202010,345,335Scanning probe microscope and scanning method thereof201910,161,958Three-dimensional fine movement device201810,151,773Scanning probe microscope and probe contact detection method20189,921,241'Scanning probe microscope and measurement range adjusting method for scanning probe microscope'20189,766,267'Actuator position calculation device, actuator position calculation method, and actuator position calculation program'20179,645,170'Scanning probe microscope'20179,354,248'Method for measuring vibration characteristic of cantilever'20168,859,279'Cell detachment method'20148,719,959'Cantilever, cantilever system, and probe microscope and adsorption mass sensor including the cantilever system'20148,615,811'Method of measuring vibration characteristics of cantilever'20138,608,373'Softening point measuring apparatus and thermal conductivity measuring apparatus'20138,214,915'Cantilever, cantilever system, scanning probe microscope, mass sensor apparatus, viscoelasticity measuring instrument, manipulation apparatus, displacement determination method of cantilever, vibration method of cantilever and deformation method of cantilever'20127,973,942'Optical displacement detection mechanism and surface information measurement device using the same'20117,945,965'Sensor for observations in liquid environments and observation apparatus for use in liquid environments'20117,861,577'Electric potential difference detection method and scanning probe microscope'20117,823,470'Cantilever and cantilever manufacturing method'20107,614,288'Scanning probe microscope fine-movement mechanism and scanning probe microscope using same'20097,605,368'Vibration-type cantilever holder and scanning probe microscope'20097,580,125'Liquid cell'20097,456,400'Scanning probe microscope and scanning method'20087,375,322'Cantilever holder and scanning probe microscope'20087,170,054'Scanning probe microscopy cantilever holder and scanning probe microscope using the cantilever holder'20077,026,607'Scanning probe microscope'20064,902,892'Method of measurement by scanning tunneling microscope'1990Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1990–2011Patents assigned to SEIKO INSTR INC (5)· patent assignee history
1990–2020Based in Tokyo, JP· patent location history
2006–2014Patents assigned to SII NANOTECHNOLOGY INC (11)· patent assignee history
2006–2014Based in Chiba, JP· patent location history
2012–2014Patents assigned to SHIGENO MASATSUGU (5)· patent assignee history
2014–2020Patents assigned to HITACHI HIGH TECH SCIENCE CORP (7)· patent assignee history
2017Patents assigned to HITACHI HIGH-TECH SCIENCE CORP (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SII NANOTECHNOLOGY INC | 11 | 2006–2014 |
| HITACHI HIGH TECH SCIENCE CORP | 7 | 2014–2020 |
| SEIKO INSTR INC | 5 | 1990–2011 |
| SHIGENO MASATSUGUself | 5 | 2012–2014 |
| HITACHI HIGH-TECH SCIENCE CORP | 2 | 2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Chiba, JP | 16 | 2006–2014 |
| Tokyo, JP | 9 | 1990–2020 |