Inventor
Anuja E. DeSilva
Inventor
Slingerlands, NY, US
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices28%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1028%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices12%
H05KPrinted circuits8%
H10DInorganic electric semiconductor devices8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
PatentTitleYear
10,580,652Alternating hardmasks for tight-pitch line formation202010,141,188Resist having tuned interface hardmask layer for EUV exposure201810,134,592Resist having tuned interface hardmask layer for EUV exposure201810,103,022Alternating hardmasks for tight-pitch line formation20189,929,012'Resist having tuned interface hardmask layer for EUV exposure'20189,911,647'Self aligned conductive lines'20189,786,554'Self aligned conductive lines'2017Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2017–2020Patents assigned to IBM (7)· patent assignee history
2017–2020Based in Slingerlands, NY, US· patent location history
2020Patents assigned to TESSERA INC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 7 | 2017–2020 |
| TESSERA INC | 1 | 2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Slingerlands, New York, US | 7 | 2017–2020 |