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Inventor

Toshio Seki

Inventor
Kyoto, JP

Overview

11→
Patents
1987–2018
Patent span
Electricity
Primary field (CPC H)

Patents· 11 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
H01JElectric discharge tubes or discharge lamps23%
C23FNon-mechanical removal of metallic material from surface10%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems7%
G01DMeasuring not specially adapted for a specific variable7%
G02BOptical elements, systems or apparatus7%
H01LSemiconductor devices7%
B81BMicrostructural devices or systems, e.g. micromechanical devices3%
B82YSpecific uses or applications of nanostructures3%
G11BInformation storage based on relative movement between record carrier and transducer3%
PatentTitleYear
9,881,815'Substrate cleaning method, substrate cleaning device, and vacuum processing device'20189,663,862'Method of smoothing solid surface with gas cluster ion beam and solid surface smoothing apparatus'20178,764,952'Method for smoothing a solid surface'20148,481,981'Method of smoothing solid surface with gas cluster ion beam and solid surface smoothing apparatus'20138,461,051'Cluster jet processing method, semiconductor element, microelectromechanical element, and optical component'20138,268,183'Method of processing solid surface with gas cluster ion beam'20128,178,857'Method and apparatus for flattening solid surface'20127,563,379'Dry etching method and photonic crystal device fabricated by use of the same'20097,405,394'Gas cluster-ion irradiation apparatus'20084,853,632'Apparatus for magnetically detecting a position of a movable magnetic body'19894,639,807'Magnetic detector having magnetoresistive elements'1987

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1987–1989Based in Hitachi, JP· patent location history
2008–2018Based in Kyoto, JP· patent location history
2009–2014Patents assigned to JAPAN AVIATION ELECTRON (5)· patent assignee history
2012–2014Patents assigned to MATSUO JIRO (5)· patent assignee history
2012–2014Patents assigned to SEKI TOSHIO (5)· patent assignee history
2012–2014Patents assigned to BOURELLE EMMANUEL (4)· patent assignee history
2012–2014Patents assigned to SATO AKINOBU (4)· patent assignee history
2013Based in Uji, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
JAPAN AVIATION ELECTRON52009–2014
MATSUO JIRO52012–2014
SEKI TOSHIOself52012–2014
BOURELLE EMMANUEL42012–2014
SATO AKINOBU42012–2014
Locations
LocationPatentsSpan
Kyoto, JP82008–2018
Hitachi, JP21987–1989
Uji, JP12013