Inventor
Chao-Hsin Chang
Inventor
Hsinchu, TW
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
G01NInvestigating or analysing materials by determining their chemical or physical properties16%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1012%
G05BControl or regulating systems in general8%
G06QInformation and communication technology [ict] specially adapted for administrative, commercial, financial, managerial or supervisory purposes8%
Y02PClimate change mitigation technologies in the production or processing of goods8%
Y10TTechnical subjects covered by former us classification8%
A43BCharacteristic features of footwear4%
C03CChemical composition of glasses, glazes or vitreous enamels4%
G01MTesting static or dynamic balance of machines or structures4%
PatentTitleYear
11,070,185Bulk acoustic wave filter and a method of frequency tuning for bulk acoustic wave resonator of bulk acoustic wave filter20219,825,454'Protection device and method for electronic device'20177,818,896'Sole ventilation system'20107,003,365'System and method of reserving capacity for a pre-process order'20066,728,586'Microelectronic fabrication production control method and system providing enhanced microelectronic fabrication facility utilization flexibility'20046,500,680'Service code system and method for scheduling fabrication facility utilization'20026,389,323'Method and system for yield loss analysis by yield management system'20026,308,576'Method for determining stress effect on a film during scrubber clean'20016,261,843'Test pattern for monitoring metal corrosion on integrated circuit wafers'20016,153,497'Method for determining a cause for defects in a film deposited on a wafer'20006,017,771'Method and system for yield loss analysis by yield management system'20005,877,064'Method for marking a wafer'19995,874,309'Method for monitoring metal corrosion on integrated circuit wafers'19995,783,493'Method for reducing precipitate defects using a plasma treatment post BPSG etchback'19985,783,097'Process to avoid dielectric damage at the flat edge of the water'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2006Patents assigned to TAIWAN SEMICONDUCTOR MFG (12)· patent assignee history
1998–2006Based in Hsinchu, TW· patent location history
2000–2001Based in Taoyuan, TW· patent location history
2010Patents assigned to CHANG CHAO HSIN (1)· patent assignee history
2010Patents assigned to HSIEH KAN-ZEN (1)· patent assignee history
2010Based in Coral Gables, FL, US· patent location history
2017Patents assigned to WISTRON CORP (1)· patent assignee history
2017Based in New Taipei, TW· patent location history
2021Patents assigned to WIN SEMICONDUCTORS CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG | 12 | 1998–2006 |
| CHANG CHAO HSINself | 1 | 2010 |
| HSIEH KAN-ZEN | 1 | 2010 |
| WIN SEMICONDUCTORS CORP | 1 | 2021 |
| WISTRON CORP | 1 | 2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 10 | 1998–2006 |
| Taoyuan, TW | 2 | 2000–2001 |
| New Taipei, TW | 1 | 2017 |
| Coral Gables, Florida, US | 1 | 2010 |