Inventor
Sang-Mun Chon
Inventor
Yongin-si, KR
Overview
Patents· 41 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
G01NInvestigating or analysing materials by determining their chemical or physical properties10%
C11DDetergent compositions9%
C23CCoating metallic material5%
H10DInorganic electric semiconductor devices4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
Y10TTechnical subjects covered by former us classification3%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds2%
C08LCompositions of macromolecular compounds2%
PatentTitleYear
7,863,231'Thinner composition and method of removing photoresist using the same'20117,858,527'Additive composition, slurry composition including the same, and method of polishing an object using the slurry composition'20107,678,751'Composition for removing photoresist, method of removing photoresist and method of manufacturing a semiconductor device using the same'20107,642,200'Methods of forming a thin film and methods of manufacturing a capacitor and a gate structure using the same'20107,605,094'Method of forming metal oxide using an atomic layer deposition process'20097,573,568'Method and apparatus for detecting a photolithography processing error, and method and apparatus for monitoring a photolithography process'20097,433,032'Method and apparatus for inspecting defects in multiple regions with different parameters'20087,387,988'Thinner composition and method of removing photoresist using the same'20087,385,689'Method and apparatus for inspecting substrate pattern'20087,311,857'Etching composition, method of preparing the same, method of etching an oxide film, and method of manufacturing a semiconductor device'20077,310,140'Method and apparatus for inspecting a wafer surface'20077,288,212'Additive composition, slurry composition including the same, and method of polishing an object using the slurry composition'20077,271,890'Method and apparatus for inspecting defects'20077,258,931'Semiconductor wafers having asymmetric edge profiles that facilitate high yield processing by inhibiting particulate contamination'20077,250,379'Method of forming metal oxide using an atomic layer deposition process'20077,223,721'Resist and etching by-product removing composition and resist removing method using the same'20077,183,192'Composition for removing photoresist and method of forming a bump electrode in a semiconductor device using the composition'20077,179,537'Spin-on glass composition and method of forming silicon oxide layer in semiconductor manufacturing process using the same'20077,113,274'Method and apparatus for inspecting a substrate'20067,027,638'Wafer color variation correcting method, selective wafer defect detecting method, and computer readable recording media for the same'20066,927,077'Method and apparatus for measuring contamination of a semiconductor substrate'20056,869,215'Method and apparatus for detecting contaminants in ion-implanted wafer'20056,870,948'Method and apparatus for numerically analyzing grain growth on semiconductor wafer using SEM image'20056,816,029'RF matching unit'20046,713,440'Resist and etching by-product removing composition and resist removing method using the same'20046,706,646'Spin-on glass composition and method of forming silicon oxide layer in semiconductor manufacturing process using the same'20046,682,876'Thinner composition and method of stripping a photoresist using the same'20046,655,042'System and method for drying semiconductor substrate'20036,590,378'Real time parameter monitoring apparatus for high voltage chamber in semiconductor wafer processing system'20036,589,719'Photoresist stripper compositions'20036,528,333'Method of and device for detecting micro-scratches'20036,515,293'Method and apparatus for detecting thickness of thin layer formed on a wafer'20036,508,887'Resist removing composition and resist removing method using the same'20036,503,682'Photoresist composition, preparation method thereof and method for forming a pattern during semiconductor processing using the photoresist composition'20036,449,037'Method of and device for detecting micro-scratches'20026,440,760'Method of measuring etched state of semiconductor wafer using optical impedence measurement'20026,398,874'Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same'20026,274,537'Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same'20016,165,841'Method for fabricating capacitors with hemispherical grains'20006,137,018'Chemical refining method and reuse system for semiconductor device manufacturing'20005,846,921'Semiconductor substrate cleaning solutions, methods of forming the same, and methods using the same'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2011Patents assigned to SAMSUNG ELECTRONICS CO LTD (40)· patent assignee history
1998–2007Based in Kyungki-do, KR· patent location history
2001–2007Based in Sungnam, KR· patent location history
2003–2011Based in Yongin-si, KR· patent location history
2003–2007Based in Seongnam, KR· patent location history
2005Patents assigned to SAMSUNG ELECTRIC (1)· patent assignee history
2007–2010Based in Gyeonggi-do, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 40 | 1998–2011 |
| SAMSUNG ELECTRIC | 1 | 2005 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yongin-si, KR | 12 | 2003–2011 |
| Kyungki-do, KR | 7 | 1998–2007 |
| Sungnam, KR | 7 | 2001–2007 |
| Gyeonggi-do, KR | 4 | 2007–2010 |
| Seongnam, KR | 4 | 2003–2007 |