Inventor

HENG-HSIN LIU

Inventor

TW

Overview

2021–2026

Patent span

Physics

Primary field (CPC G)

Patents· 93 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices43%

H05GX-ray technique25%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%

G21KHandling of particles or ionising radiation not otherwise provided for5%

G02BOptical elements, systems or apparatus4%

H01LSemiconductor devices3%

G06TImage data processing or generation, in general2%

G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light1%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry1%

B08BCleaning in general1%

PatentTitleYear

12,591,182Lithography contamination control2026 12,572,080Lithography system and methods2026 12,560,868System and method for omnidirectional real time detection of photolithography characteristics2026 12,541,152EUV lithography system with 3D sensing and tunning modules2026 12,523,942Exposure method and exposure apparatus2026 12,520,385Semiconductor processing tool and methods of operation2026 12,513,809Semiconductor processing tool and methods of operation2025 12,487,534Semiconductor processing tool and methods of operation2025 12,461,454Semiconductor processing tool and method of using the same2025 12,449,734Lithography apparatus and method2025 12,422,755Semiconductor processing tool and methods of operation2025 12,405,529Lithography system and methods2025 12,372,880System and method for detecting debris in a photolithography system2025 12,372,878Inspection system for extreme ultraviolet (EUV) light source2025 12,372,887Methods of cleaning a lithography system2025 12,360,464Lithography system and method thereof2025 12,360,458Radiation collector2025 12,353,142Semiconductor processing tool and methods of operation2025 12,298,672Semiconductor processing tool and methods of operation2025 12,287,572Lithography system and methods2025 12,283,512Semiconductor processing method and apparatus2025 12,265,336Semiconductor processing tool and methods of operation2025 12,235,593System and method for dynamically controlling temperature of thermostatic reticles2025 12,235,586EUV photolithography system fuel source and methods of operating the same2025 12,228,863EUV light source contamination monitoring system2025 12,216,413Device and method to remove debris from an extreme ultraviolet (EUV) lithography system2025 12,210,296Method of cleaning wafer table of photolithography system and method of manufacturing integrated circuit2025 12,210,295Reticle cleaning device and method of use2025 12,189,298EUV vessel perimeter flow auto adjustment2025 12,174,545System and method for performing extreme ultraviolet photolithography processes2024 12,167,526Method and system for generating droplets for EUV photolithography processes2024 12,164,235Semiconductor processing tool and methods of operation2024 12,158,701Particle removal device and method2024 12,147,166Mitigating long-term energy decay of laser devices2024 12,130,555Method and apparatus for mitigating contamination2024 12,119,129EUV lithography apparatus2024 12,111,582Substrate stage and substrate processing system using the same2024 12,111,583Semiconductor processing tool and methods of operation2024 12,114,411Apparatus and method for generating extreme ultraviolet radiation2024 12,096,544Lithography thermal control2024 12,096,543Method for using radiation source apparatus2024 12,085,865System and method for detecting debris in a photolithography system2024 12,085,860System and method for monitoring and controlling extreme ultraviolet photolithography processes2024 12,078,933System and method for omnidirectional real time detection of photolithography characteristics2024 12,066,761Inspection tool for an extreme ultraviolet radiation source to observe tin residual2024 12,063,734Droplet generator assembly and method of replacing components2024 12,061,423Method and apparatus for mitigating tin debris2024 12,055,867Lithography contamination control2024 12,019,378Methods of cleaning a lithography system2024 12,007,694Lithography apparatus and method2024 11,966,170Lithographic overlay correction and lithographic process2024 11,953,839Highly efficient automatic particle cleaner method for EUV systems2024 11,948,702Radiation source apparatus and method for using the same2024 11,906,902Semiconductor processing tool and methods of operation2024 11,852,978EUV lithography system with 3D sensing and tunning modules2023 11,841,625Device and method to remove debris from an extreme ultraviolet (EUV) lithography system2023 11,830,754Semiconductor processing method and apparatus2023 11,822,256Semiconductor processing tool and methods of operation2023 11,809,087Semiconductor processing tool and methods of operation2023 11,809,083EUV photolithography system fuel source and methods of operating the same2023 11,803,129Semiconductor processing tool and methods of operation2023 11,782,350Lithography system and method thereof2023 11,768,437System and method for performing extreme ultraviolet photolithography processes2023 11,747,741Substrate stage, substrate processing system using the same, and method for processing substrate2023 11,747,735EUV vessel perimeter flow auto adjustment2023 11,720,035Mitigating long-term energy decay of laser devices2023 11,693,324System and method for detecting debris in a photolithography system2023 11,693,326System and method for dynamically controlling temperature of thermostatic reticles2023 11,694,820Radiation source apparatus and method for using the same2023 11,681,234Mask for attracting charged particles and method for using the same2023 11,675,272Method and apparatus for mitigating contamination2023 11,662,668Lithography contamination control2023 11,650,512Reticle cleaning device and method of use2023 11,647,578Lithography thermal control2023 11,632,849Method and apparatus for mitigating contamination2023 11,605,477EUV lithography apparatus2023 11,602,037Apparatus and method for generating extreme ultraviolet radiation2023 11,576,250Semiconductor processing tool and methods of operation2023 11,567,415Inspection system for extreme ultraviolet (EUV) light source2023 11,556,065Wafer stage and method thereof2023 11,553,581Radiation source apparatus and method for using the same2023 11,537,053Semiconductor processing tool and methods of operation2022 11,533,799System and method for supplying target material in an EUV light source2022 11,528,797Method and system for generating droplets for EUV photolithography processes2022 11,520,243Lithography system and method thereof2022 11,520,246Highly efficient automatic particle cleaner method for EUV systems2022 11,500,299Exposure method and exposure apparatus2022 11,442,365EUV photolithography system and methods of operating the same2022 11,437,161Lithography apparatus and method for using the same2022 11,392,040System and method for performing extreme ultraviolet photolithography processes2022 11,392,041Particle removal device and method2022 11,162,777Wafer alignment mark scheme2021 11,153,957Apparatus and method for generating an electromagnetic radiation2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2026Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (93)· patent assignee history

2021–2026Based in TW· patent location history

2026Patents assigned to TAIWAN SEMCONDUCTOR MFG COMPANY LTD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TAIWAN SEMICONDUCTOR MFG CO LTD	93	2021–2026
TAIWAN SEMCONDUCTOR MFG COMPANY LTD	1	2026

Locations

Location	Patents	Span
TW	93	2021–2026