Inventor
Stilian Ivanov Pandev
Inventor
Santa Clara, CA, US
Overview
Patents· 45 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%
G01NInvestigating or analysing materials by determining their chemical or physical properties17%
G01BMeasuring length, thickness or similar linear dimensions14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
H01LSemiconductor devices12%
G06FElectric digital data processing7%
G06TImage data processing or generation, in general7%
G06KGraphical data reading3%
G06VImage or video recognition or understanding3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
PatentTitleYear
10,943,838Measurement of overlay error using device inspection system202110,935,893Differential methods and apparatus for metrology of semiconductor targets202110,801,953Semiconductor metrology based on hyperspectral imaging202010,769,320Integrated use of model-based metrology and a process model202010,732,516Process robust overlay metrology based on optical scatterometry202010,612,916Measurement of multiple patterning parameters202010,580,673Semiconductor metrology and defect classification using electron microscopy202010,502,694Methods and apparatus for patterned wafer characterization201910,502,549Model-based single parameter measurement201910,490,462Metrology systems and methods for process control201910,386,729Dynamic removal of correlation of highly correlated parameters for optical metrology201910,380,728Model-based metrology using images201910,365,225Multi-location metrology201910,352,876Signal response metrology for scatterometry based overlay measurements201910,354,929Measurement recipe optimization based on spectral sensitivity and process variation201910,345,095Model based measurement systems with improved electromagnetic solver performance201910,295,342System, method and computer program product for calibration of metrology tools201910,255,385Model optimization approach based on spectral sensitivity201910,234,271Method and system for spectroscopic beam profile metrology including a detection of collected light according to wavelength along a third dimension of a hyperspectral detector201910,215,559Metrology of multiple patterning processes201910,216,096Process-sensitive metrology systems and methods201910,210,606Signal response metrology for image based and scatterometry overlay measurements201910,152,678System, method and computer program product for combining raw data from multiple metrology tools201810,151,986Signal response metrology based on measurements of proxy structures201810,152,654Signal response metrology for image based overlay measurements201810,139,352Measurement of small box size targets201810,107,765Apparatus, techniques, and target designs for measuring semiconductor parameters201810,101,670Statistical model-based metrology201810,101,676Spectroscopic beam profile overlay metrology201810,101,674Methods and apparatus for determining focus201810,072,921Methods and systems for spectroscopic beam profile metrology having a first two dimensional detector to detect collected light transmitted by a first wavelength dispersive element201810,062,157Compressive sensing for metrology201810,030,965Model-based hot spot monitoring20189,934,353Focus measurements using scatterometry metrology20189,875,946On-device metrology20189,816,810'Measurement of multiple patterning parameters'20179,784,690'Apparatus, techniques, and target designs for measuring semiconductor parameters'20179,721,055'Measurement model optimization based on parameter variations across a wafer'20179,710,728'Image based signal response metrology'20179,569,834'Automated image-based process monitoring and control'20179,518,916'Compressive sensing for metrology'20169,490,182'Measurement of multiple patterning parameters'20169,383,661'Methods and apparatus for determining focus'20169,255,877'Metrology system optimization for parameter tracking'20168,843,875'Measurement model optimization based on parameter variations across a wafer'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2021Patents assigned to KLA TENCOR CORP (44)· patent assignee history
2014–2021Based in Santa Clara, CA, US· patent location history
2018–2019Patents assigned to KLA—TENCOR CORP (3)· patent assignee history
2018Patents assigned to KLA TENOR CORP (1)· patent assignee history
2019Patents assigned to DZIURA THADDEUS GERARD (1)· patent assignee history
2020Patents assigned to KLA CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA TENCOR CORP | 44 | 2014–2021 |
| KLA—TENCOR CORP | 3 | 2018–2019 |
| DZIURA THADDEUS GERARD | 1 | 2019 |
| KLA CORP | 1 | 2020 |
| KLA TENOR CORP | 1 | 2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Santa Clara, California, US | 45 | 2014–2021 |