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Inventor

Chia S. Tsai

Inventor
Hsinchu, TW

Overview

2→
Patents
1996–2002
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Wprimary
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1067%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
PatentTitleYear
6,440,863'Plasma etch method for forming patterned oxygen containing plasma etchable layer'20025,521,121'Oxygen plasma etch process post contact layer etch back'1996

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–2002Patents assigned to TAIWAN SEMICONDUCTOR MFG (2)· patent assignee history
1996–2002Based in Hsinchu, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG21996–2002
Locations
LocationPatentsSpan
Hsinchu, TW21996–2002