Inventor

Nitesh Pandey

Inventor

Eindhoven, NL

Overview

29→

Patents

2017–2021

Patent span

Physics

Primary field (CPC G)

Patents· 29 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices41%

G01NInvestigating or analysing materials by determining their chemical or physical properties24%

G01BMeasuring length, thickness or similar linear dimensions19%

G02BOptical elements, systems or apparatus4%

G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%

F21VFunctional features or details of lighting devices or systems thereof1%

F21YIndexing scheme associated with subclasses f21k, f21l, f21s and f21v, relating to the form or the kind of the light sources or of the colour of the light emitted1%

G03HHolographic processes or apparatus1%

G06FElectric digital data processing1%

G06TImage data processing or generation, in general1%

PatentTitleYear

10,949,375Methods and apparatus for an interface2021 10,866,526Metrology method and device2020 10,845,304Scatterometer and method of scatterometry using acoustic radiation2020 10,816,909Metrology system and method for determining a characteristic of one or more structures on a substrate2020 10,795,269Method of determining a value of a parameter of interest, method of cleaning a signal containing information about a parameter of interest, device manufacturing method2020 10,788,758Method of measuring a parameter of interest, device manufacturing method, metrology apparatus, and lithographic system2020 10,775,704Method of measuring a structure, inspection apparatus, lithographic system, device manufacturing method and wavelength-selective filter for use therein2020 10,747,124Method of measuring a target, metrology apparatus, polarizer assembly2020 10,678,145Radiation receiving system2020 10,670,975Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measured2020 10,656,534Method of measuring, device manufacturing method, metrology apparatus, and lithographic system2020 10,620,550Metrology method and apparatus2020 10,599,047Metrology apparatus, lithographic system, and method of measuring a structure2020 10,444,638Method for parameter determination and apparatus thereof2019 10,444,640Metrology apparatus, lithographic system, and method of measuring a structure2019 10,423,077Metrology method and apparatus, computer program and lithographic system2019 10,393,514Topography measurement system2019 10,394,143Topography measurement system2019 10,386,735Lithographic apparatus alignment sensor and method2019 10,365,565Method of measuring a structure, inspection apparatus, lithographic system, device manufacturing method and wavelength-selective filter for use therein2019 10,353,298Method of measuring a target, metrology apparatus, polarizer assembly2019 10,310,389Method of measuring, device manufacturing method, metrology apparatus, and lithographic system2019 10,234,767Device and method for processing a radiation beam with coherence2019 10,191,391Metrology method and apparatus, computer program and lithographic system2019 10,180,630Illumination system for a lithographic or inspection apparatus2019 10,067,426Metrology apparatus for measuring a structure formed on a substrate by a lithographic process, lithographic system, and method of measuring a structure formed on a substrate by a lithographic process2018 9,982,991Method for controlling a distance between two objects, inspection apparatus and method2018 9,909,983'Method and apparatus for improving measurement accuracy'2018 9,632,039'Inspection apparatus, inspection method and manufacturing method'2017

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2017–2020Patents assigned to ASML NETHERLANDS BV (28)· patent assignee history

2017–2020Based in Eindhoven, NL· patent location history

2020Patents assigned to ASML HOLDING NV (1)· patent assignee history

2020Patents assigned to KOOLEN ARMAND EUGENE ALBERT (1)· patent assignee history

2020Patents assigned to PANDEY NITESH (1)· patent assignee history

2021Patents assigned to SEMICONDUCTOR COMPONENTS IND LLC (1)· patent assignee history

2021Based in Mumbai, IN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ASML NETHERLANDS BV	28	2017–2020
ASML HOLDING NV	1	2020
KOOLEN ARMAND EUGENE ALBERT	1	2020
PANDEY NITESHself	1	2020
SEMICONDUCTOR COMPONENTS IND LLC	1	2021

Locations

Location	Patents	Span
Eindhoven, NL	28	2017–2020
Mumbai, IN	1	2021