Inventor
Kenji Momose
Inventor
Chichibu, JP
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%
C23CCoating metallic material21%
C30BSingle-crystal growth21%
H01LSemiconductor devices14%
H10DInorganic electric semiconductor devices12%
H01JElectric discharge tubes or discharge lamps5%
PatentTitleYear
10,176,987SiC epitaxial wafer and method for manufacturing the same20199,768,047'SiC epitaxial wafer and method for producing same, and device for producing SiC epitaxial wafer'20179,679,767'SiC epitaxial wafer and method for manufacturing the same'20179,624,602'Epitaxial wafer manufacturing device and manufacturing method'20179,607,832'Epitaxial wafer manufacturing device and manufacturing method'20179,287,121'SIC epitaxial wafer and method for manufacturing same'20168,823,015'Silicon carbide epitaxial wafer and manufacturing method therefor'20148,716,718'Epitaxial SiC single crystal substrate and method of manufacture of epitaxial SiC single crystal substrate'20148,293,623'Epitaxial SiC single crystal substrate and method of manufacture of epitaxial SiC single crystal substrate'20125,698,062'Plasma treatment apparatus and method'19975,246,529'Plasma processing method'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993Based in Nirasaki, JP· patent location history
1997Based in Yamanashi, JP· patent location history
2012–2019Patents assigned to SHOWA DENKO KK (9)· patent assignee history
2012–2017Patents assigned to MOMOSE KENJI (6)· patent assignee history
2012–2016Patents assigned to ODAWARA MICHIYA (4)· patent assignee history
2012–2019Based in Chichibu, JP· patent location history
2016–2017Patents assigned to KAGESHIMA Yoshiaki (3)· patent assignee history
2016–2017Patents assigned to MUTO DAISUKE (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHOWA DENKO KK | 9 | 2012–2019 |
| MOMOSE KENJIself | 6 | 2012–2017 |
| ODAWARA MICHIYA | 4 | 2012–2016 |
| KAGESHIMA Yoshiaki | 3 | 2016–2017 |
| MUTO DAISUKE | 3 | 2016–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Chichibu, JP | 9 | 2012–2019 |
| Yamanashi, JP | 1 | 1997 |
| Nirasaki, JP | 1 | 1993 |