Inventor
Hirotsugu Wada
Inventor
Tokyo, JP
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps29%
B82YSpecific uses or applications of nanostructures13%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
H02JElectric power networks6%
B60LPropulsion of electrically-propelled vehicles3%
C23FNon-mechanical removal of metallic material from surface3%
C25DProcesses for the electrolytic or electrophoretic production of coatings3%
G01HMeasurement of mechanical vibrations or ultrasonic, sonic or infrasonic waves3%
G01MTesting static or dynamic balance of machines or structures3%
PatentTitleYear
11,125,654Abnormality cause identifying system for device including rotating member20219,490,638'Electrical power transmission system and electrical power output device'20168,552,594'Noncontact power feed system, noncontact relay apparatus, noncontract power reception apparatus, and noncontact power feed method'20135,843,603'Method of evaluating shaped beam of charged beam writer and method of forming pattern'19985,358,808'Exposure mask, method of manufacturing the same, and exposure method using the same'19945,254,417'Reflection mask and electrically charged beam exposing apparatus using the reflection mask'19935,234,780'Exposure mask, method of manufacturing the same, and exposure method using the same'19935,047,646'Method of correcting astigmatism of variable shaped beam'19914,647,782'Charged particle beam exposure apparatus'19874,636,968'Method of positioning a beam to a specific portion of a semiconductor wafer'19874,558,225'Target body position measuring method for charged particle beam fine pattern exposure system'19854,543,512'Electron beam exposure system'19854,346,325'Electron gun'19824,269,653'Aperture stop'1981Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1981–1982Patents assigned to VLSI TECHNOLOGY RES ASS (2)· patent assignee history
1981–1985Based in Machida, JP· patent location history
1985–1987Patents assigned to TOKYO SHIBAURA ELECTRIC CO (3)· patent assignee history
1985–1998Based in Tokyo, JP· patent location history
1987–1998Patents assigned to TOSHIBA KK (6)· patent assignee history
2013–2016Patents assigned to FUJIMAKI KENICHI (2)· patent assignee history
2013–2016Patents assigned to SONY CORP (2)· patent assignee history
2013–2016Based in Kanagawa, JP· patent location history
2021Based in Kobe, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOSHIBA KK | 6 | 1987–1998 |
| TOKYO SHIBAURA ELECTRIC CO | 3 | 1985–1987 |
| FUJIMAKI KENICHI | 2 | 2013–2016 |
| SONY CORP | 2 | 2013–2016 |
| VLSI TECHNOLOGY RES ASS | 2 | 1981–1982 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 8 | 1985–1998 |
| Machida, JP | 3 | 1981–1985 |
| Kanagawa, JP | 2 | 2013–2016 |
| Kobe, JP | 1 | 2021 |