Inventor

Jin-Hee Bae

Inventor

Suwon-si, KR

Overview

2011–2020

Patent span

Electricity

Primary field (CPC H)

Patents· 20 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds15%

C09DCoating compositions, e.g. paints, varnishes or lacquers13%

H01LSemiconductor devices13%

H10DInorganic electric semiconductor devices7%

C08LCompositions of macromolecular compounds6%

H01BCables6%

C01BNon-metallic elements6%

B05DProcesses for applying fluent materials to surfaces, in general4%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%

PatentTitleYear

10,804,095Composition for forming silica layer, silica layer, and electronic device2020 10,427,944Composition for forming a silica based layer, silica based layer, and electronic device2019 10,153,171Method of forming patterns, patterns formed according to the method, and semiconductor device including the patterns2018 10,106,687Composition for forming silica layer, method for manufacturing silica layer and silica layer2018 10,093,830Composition for forming a silica based layer, method for manufacturing silica based layer, and electronic device including the silica based layer2018 10,017,646Composition for forming silica layer, method for manufacturing silica layer, and electric device including silica layer2018 10,020,185Composition for forming silica layer, silica layer, and electronic device2018 9,957,418Composition for forming silica layer, method for manufacturing silica layer, and silica layer2018 9,902,873'Composition for forming silica based layer, and method for manufacturing silica based layer'2018 9,890,255'Modified hydrogenated polysiloxazane, composition comprising same for forming silica-based insulation layer, method for preparing composition for forming'2018 9,738,787'Composition for forming silica-based insulating layer, method for preparing composition for forming silica-based insulating layer, silica-based insulating layer, and method for manufacturing silica-based insulating layer'2017 9,721,785'Method for manufacturing silica layer, silica layer, and electronic device'2017 9,312,122'Rinse liquid for insulating film and method of rinsing insulating film'2016 9,240,443'Process of preparing a gap filler agent, a gap filler agent prepared using same, and a method for manufacturing semiconductor capacitor using the gap filler agent'2016 9,096,726'Composition for forming silica based insulating layer, method for manufacturing composition for forming silica based insulating layer, silica based insulating layer and method for manufacturing silica based insulating layer'2015 9,082,612'Composition for forming a silica layer, method of manufacturing the composition, silica layer prepared using the composition, and method of manufacturing the silica layer'2015 8,766,411'Filler for filling a gap, method of preparing the same and method of manufacturing semiconductor capacitor using the same'2014 8,383,737'Compound for gap-filling of semiconductor device and coating composition using the same'2013 8,299,197'Organosilane polymer with improved gap-filling property for semiconductor device and coating composition using the same'2012 8,058,711'Filler for filling a gap and method for manufacturing semiconductor capacitor using the same'2011

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2011–2018Patents assigned to CHEIL IND INC (10)· patent assignee history

2011–2016Patents assigned to BAE JIN-HEE (6)· patent assignee history

2011–2016Patents assigned to KIM SANG-KYUN (6)· patent assignee history

2011–2016Patents assigned to KWAK TAEK-SOO (6)· patent assignee history

2011–2016Based in Uiwang-si, KR· patent location history

2012–2020Based in Suwon-si, KR· patent location history

2013Based in Gyeonggi-do, KR· patent location history

2017–2020Patents assigned to SAMSUNG SDI CO LTD (10)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
CHEIL IND INC	10	2011–2018
SAMSUNG SDI CO LTD	10	2017–2020
BAE JIN-HEEself	6	2011–2016
KIM SANG-KYUN	6	2011–2016
KWAK TAEK-SOO	6	2011–2016

Locations

Location	Patents	Span
Suwon-si, KR	13	2012–2020
Uiwang-si, KR	6	2011–2016
Gyeonggi-do, KR	1	2013