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Inventor

Hans G. Franke

Inventor
Hilton, NY, US

Overview

4→
Patents
1977–1995
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Gprimary
G03GElectrography33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light17%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
PatentTitleYear
5,378,316'High durability mask for dry etch processing of GaAs'19955,185,293'Method of forming and aligning patterns in deposted overlaying on GaAs'19934,639,405'Method and apparatus for fixing toner images'19874,002,475'Photoconductive process for making electrographic masters'1977

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1977–1995Patents assigned to EASTMAN KODAK CO (4)· patent assignee history
1977–1995Based in Hilton, NY, US· patent location history
1987Based in Rochester, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EASTMAN KODAK CO41977–1995
Locations
LocationPatentsSpan
Hilton, New York, US31977–1995
Rochester, New York, US11987