Inventor

Douglas R. Robello

Inventor

Webster, NY, US

Overview

62→

Patents

1988–2020

Patent span

Physics

Primary field (CPC G)

Patents· 62 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%

G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein10%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds6%

G02BOptical elements, systems or apparatus6%

B82YSpecific uses or applications of nanostructures5%

H01LSemiconductor devices5%

H10KOrganic electric solid-state devices5%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%

B41MPrinting, duplicating, marking, or copying processes4%

PatentTitleYear

10,838,302Cross-linkable fluorinated photopolymer2020 10,739,680Cross-linkable fluorinated photopolymer2020 10,503,074Photolithographic patterning of devices2019 10,289,000Cross-linkable fluorinated photopolymer2019 10,078,262Patterning devices using branched fluorinated photopolymers2018 9,991,114Photolithographic patterning of electronic devices2018 9,958,778Cross-linkable fluorinated photopolymer2018 9,817,310'Branched fluorinated photopolymers'2017 9,541,829'Cross-linkable fluorinated photopolymer'2017 9,523,011'Recirculating inkjet printing fluid'2016 9,500,948'Fluorinated photoresist with integrated sensitizer'2016 9,335,636'Method of patterning a device'2016 9,298,088'Fluorinated photopolymer with fluorinated sensitizer'2016 9,122,167'Method of patterning a device'2015 9,109,221'Particles containing organic catalytic materials and uses'2015 9,104,104'Method of patterning a device'2015 8,692,238'Semiconductor devices and methods of preparation'2014 8,434,857'Recirculating fluid printing system and method'2013 8,430,492'Inkjet printing fluid'2013 8,119,328'Imaging element and method using differential light scattering'2012 7,989,536'Exfoliated nanocomposites and articles containing same'2011 7,875,314'Method for using receiver medium having adjustable properties'2011 7,781,076'Heteropyrene-based semiconductor materials for electronic devices and methods of making the same'2010 7,480,021'Optical films having reverse dispersion'2009 7,459,263'Optical recording media with triplet-sensitized isomerization'2008 7,195,829'Organic element for electroluminescent devices'2007 7,090,930'Organic element for electroluminescent devices'2006 7,022,392'In-situ polymerized matrix for isomerized optical recording article'2006 6,969,578'Optical recording material'2005 6,867,255'Exfoliated polystyrene-clay nanocomposite comprising star-shaped polymer'2005 6,770,406'Imaging element containing a polymeric benzylic blocked developer'2004 6,749,977'Imaging element containing a polymeric heteroaromatic blocked developer'2004 6,686,407'Exfoliated polystyrene-clay nanocomposite comprising star-shaped polymer'2004 6,569,600'Optical recording material'2003 6,051,531'Polymeric absorber for laser-colorant transfer'2000 6,051,532'Polymeric absorber for laser-colorant transfer'2000 5,998,088'Heterogeneous image layer for laser ablative imaging'1999 5,723,264'Pattern transfer techniques for fabrication of lenslet arrays using specialized polyesters'1998 5,717,106'Chromene dyes'1998 5,712,223'Chromeme dyes for thermal imaging'1998 5,712,079'Barrier layer for laser ablative imaging'1998 5,691,116'Pattern transfer techniques for fabrication of lenslet arrays for solid state imagers'1997 5,605,783'Pattern transfer techniques for fabrication of lenslet arrays for solid state imagers'1997 5,501,821'Optical article exhibiting a large first hyperpolarizability'1996 5,418,871'Multichannel optical waveguide page scanner with individually addressable electro-optic modulators'1995 5,410,630'Optical article containing a polymer exhibiting a high level of second order polarization susceptibility'1995 5,381,507'Optical article containing a polymer that exhibits nonlinear second order polarization susceptibility'1995 5,371,817'Multichannel optical waveguide page scanner with individually addressable electro-optic modulators'1994 5,291,567'Electro-optic waveguide deflector using a nonlinear optic film or liquid-crystal overlay cell for use in an optical pickup head'1994 5,272,002'Transparent optical article exhibiting high second order polarization susceptibility and low transmission attenuation'1993 5,247,602'Blue transparent second harmonic generator'1993 5,150,446'Conversion efficiency second harmonic generator'1992 5,075,043'Optical article containing a linear condensation polymer exhibiting a high level of second order polarization susceptibility'1991 5,053,478'Production and processing of thermally stable polyenaminonitriles'1991 5,029,979'Optical article exhibiting a high level of second order polarization susceptibility'1991 5,008,043'Optical article exhibiting a high level of second order polarization susceptibility'1991 5,008,369'Preparation of polysulfones'1991 4,966,954'Production and processing of thermally stable polyenaminonitriles and polyaminoquinolines therefrom'1990 4,946,235'Nonlinear optical waveguide device'1990 4,900,127'Optical article containing a linear polymer exhibiting a high level of second order polymerization susceptibility'1990 4,796,971'Optical article containing a polymeric matrix exhibiting a high level of second order polarization susceptibility'1989 4,792,208'Optical article exhibiting a high level of second order polarization susceptibility'1988

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1988–2016Patents assigned to EASTMAN KODAK CO (45)· patent assignee history

1988–2020Based in Webster, NY, US· patent location history

1998Based in Rochester, NY, US· patent location history

2012–2016Patents assigned to MIS MARK R (5)· patent assignee history

2012–2015Patents assigned to ROBELLO DOUGLAS R (5)· patent assignee history

2013Patents assigned to FALKNER CATHERINE A (2)· patent assignee history

2015–2020Patents assigned to ORTHOGONAL INC (14)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
EASTMAN KODAK CO	45	1988–2016
ORTHOGONAL INC	14	2015–2020
MIS MARK R	5	2012–2016
ROBELLO DOUGLAS Rself	5	2012–2015
FALKNER CATHERINE A	2	2013

Locations

Location	Patents	Span
Webster, New York, US	61	1988–2020
Rochester, New York, US	1	1998