Inventor
Cheng-Te Wang
Inventor
Hsinchu County, TW
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices36%
G06FElectric digital data processing11%
G06KGraphical data reading6%
G06TImage data processing or generation, in general6%
G10LSpeech analysis techniques or speech synthesis6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
A63FCard, board, or roulette games3%
G09GArrangements or circuits for control of indicating devices using static means to present variable information3%
G10KSound-producing devices3%
H01BCables3%
PatentTitleYear
10,796,708Method for eliminating sound and electronic device performing the same202010,658,799Transmission cable and display system202010,607,591Sound playback device and method for masking interference sound through noise masking signal thereof202010,474,026Method for correcting bevel corners of a layout pattern20199,785,046'Pattern verifying method'20179,262,820'Method and apparatus for integrated circuit design'20169,171,898'Method for manufacturing semiconductor layout pattern, method for manufacturing semiconductor device, and semiconductor device'20159,104,833'Mask set for double exposure process and method of using the mask set'20159,047,658'Method of optical proximity correction'20158,885,917'Mask pattern and correcting method thereof'20148,806,391'Method of optical proximity correction according to complexity of mask pattern'20148,778,604'Mask set for double exposure process and method of using the mask set'20148,745,547'Method for making photomask layout'20148,701,052'Method of optical proximity correction in combination with double patterning technique'20148,627,242'Method for making photomask layout'20148,383,299'Double patterning mask set and method of forming thereof'20138,225,237'Method to determine process window'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2019Patents assigned to UNITED MICROELECTRONICS CORP (14)· patent assignee history
2012–2014Patents assigned to WANG CHENG-TE (5)· patent assignee history
2012–2019Based in Hsinchu County, TW· patent location history
2013–2014Patents assigned to CHEN MING-JUI (4)· patent assignee history
2013–2014Patents assigned to HSIEH TE-HSIEN (3)· patent assignee history
2013–2014Patents assigned to LEE JING-YI (3)· patent assignee history
2014Based in Hsinchu, TW· patent location history
2020Based in Taipei, TW· patent location history
2020Based in Miao-Li County, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| UNITED MICROELECTRONICS CORP | 14 | 2012–2019 |
| WANG CHENG-TEself | 5 | 2012–2014 |
| CHEN MING-JUI | 4 | 2013–2014 |
| HSIEH TE-HSIEN | 3 | 2013–2014 |
| LEE JING-YI | 3 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu County, TW | 13 | 2012–2019 |
| Taipei, TW | 2 | 2020 |
| Miao-Li County, TW | 1 | 2020 |
| Hsinchu, TW | 1 | 2014 |