Inventor
Ronald A. Wilklow
Inventor
Fairfield, CT, US
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices36%
G02BOptical elements, systems or apparatus12%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
C23CCoating metallic material6%
H01LSemiconductor devices6%
Y10TTechnical subjects covered by former us classification6%
B82BNanostructures formed by manipulation of individual atoms, molecules, or limited collections of atoms or molecules as discrete units3%
B82YSpecific uses or applications of nanostructures3%
C09JAdhesives3%
PatentTitleYear
9,348,236'Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp'20168,902,562'Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp'20148,755,027'Lithographic apparatus and device manufacturing method involving fluid mixing and control of the physical property of a fluid'20148,736,810'EUV reticle substrates with high thermal conductivity'20148,558,988'Thin film continuous spatially modulated grey attenuators and filters'20138,027,026'Lithographic apparatus and device manufacturing method'20118,013,999'Beam characterization monitor for sensing pointing or angle of an optical beam'20117,894,040'Lithographic apparatus and device manufacturing method'20117,548,370'Layered structure for a tile wave plate assembly'20097,414,785'Ultraviolet polarization beam splitter with minimum apodization'20087,335,398'Method to modify the spatial response of a pattern generator'20087,081,278'Method for protection of adhesives used to secure optics from ultra-violet light'20066,680,794'Polarization beam splitter for photolithography'20046,480,330'Ultraviolet polarization beam splitter for microlithography'20025,429,732'High rate ion beam sputtering process'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995Based in Ridgefield, CT, US· patent location history
2002–2016Based in Fairfield, CT, US· patent location history
2004–2016Patents assigned to ASML HOLDING NV (12)· patent assignee history
2011–2014Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2013–2016Patents assigned to WILKLOW RONALD A (4)· patent assignee history
2014–2016Patents assigned to HELMUS PETER RICHARD (2)· patent assignee history
2014–2016Patents assigned to LIPSON MATTHEW (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML HOLDING NV | 12 | 2004–2016 |
| WILKLOW RONALD Aself | 4 | 2013–2016 |
| ASML NETHERLANDS BV | 3 | 2011–2014 |
| HELMUS PETER RICHARD | 2 | 2014–2016 |
| LIPSON MATTHEW | 2 | 2014–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fairfield, CT, US | 14 | 2002–2016 |
| Ridgefield, CT, US | 1 | 1995 |