Inventor
Hiroki Chisaka
Inventor
Kawasaki, JP
Overview
Patents· 22 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds14%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%
C08LCompositions of macromolecular compounds12%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients11%
C09DCoating compositions, e.g. paints, varnishes or lacquers11%
C07CAcyclic or carbocyclic compounds7%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
C08JWorking-up5%
C07DHeterocyclic compounds3%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium2%
PatentTitleYear
10,829,662Curable composition, cured product, cured film, display panel, and method for producing cured product202010,767,017Resin composition, method for producing resin composition, film formation method, and cured product202010,747,113Method of pattern formation and method of producing polysilane resin precursor202010,696,845Energy-sensitive resin composition202010,689,514Silicon-containing resin composition202010,640,607Curable composition, cured film, display panel, and method for producing cured product202010,570,269Composition containing microparticles202010,479,879Curable composition, cured product of the curable composition, and method of producing a cured product using the curable composition201910,364,372Composition and method of producing siliceous film201910,336,708Imidazole compound, metal surface treatment liquid, metal surface treatment method, and laminate production method201910,322,989Transparent body production method, transparent body, and amorphous body201910,239,989Curable composition201910,233,269Compound containing structural unit derived from vinyl ether compound201910,059,662Sulfonium salt, photoacid generator, and photosensitive composition20189,914,687'Composition containing vinyl-group-containing compound'20189,902,675'Vinyl-group-containing fluorene compound'20189,890,250'Method for producing polybenzoxazole resin'20189,891,527'Developing solution and development processing method of photosensitive resin composition'20189,683,150'Curable composition, adhesive, method of producing fiber-reinforced composite material, and fiber-reinforced composite material'20179,547,239'Positive photosensitive resin composition, method for forming polyimide resin patterns, and patterned polyimide resin film'20179,529,258'Energy-sensitive resin composition'20169,458,355'Method of producing polyimide resin, method of producing polyimide coating, method of producing polyamic acid solution, polyimide coating, and polyamic acid solution'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2020Patents assigned to TOKYO OHKA KOGYO CO LTD (22)· patent assignee history
2016–2020Based in Kawasaki, JP· patent location history
2018Patents assigned to DAICEL CORP (1)· patent assignee history
2018Based in Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO OHKA KOGYO CO LTD | 22 | 2016–2020 |
| DAICEL CORP | 1 | 2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 21 | 2016–2020 |
| Kanagawa, JP | 1 | 2018 |