Inventor
Masayuki Akagawa
Inventor
Tokyo, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
G02BOptical elements, systems or apparatus15%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests15%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form8%
G05BControl or regulating systems in general8%
Y10TTechnical subjects covered by former us classification8%
PatentTitleYear
7,963,736'Wafer processing apparatus with wafer alignment device'20116,762,412'Optical apparatus, exposure apparatus using the same, and gas introduction method'20046,671,033'Optical device, method of cleaning the same, projection aligner, and method of producing the same'20036,288,769'Optical device method of cleaning the same, projection aligner, and method of producing the same'20015,888,327'Pellicle pasting system and method'19994,856,904'Wafer inspecting apparatus'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–2004Patents assigned to NIKON CORP (5)· patent assignee history
1989Based in Kawaguchi, JP· patent location history
1999Based in Saitama, JP· patent location history
2001–2011Based in Tokyo, JP· patent location history
2011Patents assigned to ASM JAPAN (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIKON CORP | 5 | 1989–2004 |
| ASM JAPAN | 1 | 2011 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 4 | 2001–2011 |
| Saitama, JP | 1 | 1999 |
| Kawaguchi, JP | 1 | 1989 |