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Inventor

Yuichi Eriyama

Inventor
Tsukuba, JP

Overview

11→
Patents
2000–2011
Patent span
Chemistry
Primary field (CPC C)

Patents· 11 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Fprimary
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds17%
C09DCoating compositions, e.g. paints, varnishes or lacquers14%
C08LCompositions of macromolecular compounds12%
B82YSpecific uses or applications of nanostructures7%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds7%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients7%
C09CTreatment of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties7%
G02BOptical elements, systems or apparatus7%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium5%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%
PatentTitleYear
7,916,992'Dry film for optical waveguide and method for manufacturing optical waveguide by using the dry film'20117,714,096'Resin composition, cured product and optical parts'20107,352,943'Optical position sensing component, optical position sensing device, and manufacturing method thereof'20087,122,253'Curable resin composition, cured film, and composite product'20066,727,334'Resin composition and cured product'20046,528,604'Reactive silica particles, process for manufacturing the same, use of the same'20036,521,677'Radiation-curable metal particles and curable resin compositions comprising these particles'20036,355,703'Liquid curable resin composition, coating, and cured coating therefrom'20026,265,133'Radiation curable resin composition'20016,160,067'Reactive silica particles, process for manufacturing the same, use of the same'20006,013,749'Liquid curable resin composition'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2011Patents assigned to JSR CORP (10)· patent assignee history
2000–2006Patents assigned to DSM NV (8)· patent assignee history
2000–2004Patents assigned to JAPAN FINE COATINGS CO LTD (4)· patent assignee history
2000–2003Patents assigned to JAPAN FINE COATINGS (2)· patent assignee history
2000–2003Based in Tsukuba, JP· patent location history
2000–2006Based in Ibaraki, JP· patent location history
2002Based in Umezono, JP· patent location history
2003Patents assigned to JAPAN FINE COATING CO LTD (1)· patent assignee history
2004Based in Inarimae, JP· patent location history
2008–2011Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
JSR CORP102000–2011
DSM NV82000–2006
JAPAN FINE COATINGS CO LTD42000–2004
JAPAN FINE COATINGS22000–2003
JAPAN FINE COATING CO LTD12003
Locations
LocationPatentsSpan
Tsukuba, JP42000–2003
Tokyo, JP32008–2011
Ibaraki, JP22000–2006
Inarimae, JP12004
Umezono, JP12002