Inventor

Kenri Konno

Inventor
Kawasaki, JP

Overview

8→
Patents
2013–2017
Patent span
Chemistry
Primary field (CPC C)

Patents· 8 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds19%
C07CAcyclic or carbocyclic compounds10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
B29CShaping or joining of plastics5%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%
C08LCompositions of macromolecular compounds5%
C09DCoating compositions, e.g. paints, varnishes or lacquers5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2017Patents assigned to TOKYO OHKA KOGYO CO LTD (8)· patent assignee history
2013–2016Patents assigned to KONNO KENRI (5)· patent assignee history
2013–2015Patents assigned to IWASHITA JUN (4)· patent assignee history
2013–2016Based in Kawasaki, JP· patent location history
2015–2016Patents assigned to SHIONO DAIJU (3)· patent assignee history
2015–2016Patents assigned to TAKAKI DAICHI (3)· patent assignee history
2017Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO OHKA KOGYO CO LTD82013–2017
KONNO KENRIself52013–2016
IWASHITA JUN42013–2015
SHIONO DAIJU32015–2016
TAKAKI DAICHI32015–2016
Locations
LocationPatentsSpan
Kawasaki, JP72013–2016
Tokyo, JP12017