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Inventor

Manabu Tomita

Inventor
Kanagawa, JP

Overview

30→
Patents
1997–2017
Patent span
Performing operations
Primary field (CPC B)

Patents· 30 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B41Jprimary
B41JTypewriters56%
Y10TTechnical subjects covered by former us classification16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
B08BCleaning in general2%
E01HStreet cleaning2%
G01BMeasuring length, thickness or similar linear dimensions2%
G01RMeasuring electric variables2%
H01JElectric discharge tubes or discharge lamps2%
H01LSemiconductor devices2%
PatentTitleYear
9,818,661'Semiconductor unit and test method'20178,182,067'Droplet discharge head and droplet discharging unit incorporating the same'20128,087,742'Liquid ejector and method for ejecting liquid'20128,087,741'Liquid ejector and method for ejecting liquid'20127,946,680'Liquid discharging apparatus and method for manufacturing liquid discharging apparatus'20117,891,751'Liquid ejector and method for ejecting liquid'20117,883,166'Liquid ejector and method for ejecting liquid'20117,883,167'Liquid ejector and method for ejecting liquid'20117,665,827'Liquid discharge recording head having an improved oxetane resin covering layer as part of a liquid flow path and liquid discharge apparatus'20107,537,311'Method and apparatus for ejecting liquid'20097,530,668'Liquid ejection head, liquid ejection apparatus, and method for fabricating liquid ejection head'20097,524,022'Head module, liquid discharge head, and liquid discharge apparatus'20097,472,480'Method for producing liquid ejecting recording head'20097,470,004'Liquid ejection head and liquid ejection device'20087,465,031'Liquid-ejection apparatus'20087,461,451'Method for manufacturing liquid discharge head'20087,431,430'Liquid ejecting head having selectively controlled heat-energy evolving element regions'20087,410,247'Liquid ejection head and liquid ejection apparatus'20087,240,989'Liquid delivery head, liquid delivery device, and liquid delivery head driving method'20077,216,420'Method of manufacturing print head'20077,159,793'Liquid discharging head and liquid discharging device'20077,150,515'Liquid delivering device and liquid delivering method'20067,137,687'Liquid discharge head, liquid discharge apparatus, and method for forming liquid discharge head'20067,125,104'Liquid-discharging head, liquid-discharging device, and method of producing the liquid-discharging head'20067,028,402'Method of manufacturing a liquid dispenser'20066,848,770'Liquid dispenser and printer'20056,218,313'Process for producing semiconductor device, apparatus for optimizing film thickness, and process for optimizing film thickness'20016,145,118'Plotting pattern data production method electron beam plotting method substrate working method and electron beam plotting apparatus'20006,057,569'Diode limiter device'20005,634,980'Method for washing substrates'1997

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–2017Patents assigned to SONY CORP (29)· patent assignee history
1997–2017Based in Kanagawa, JP· patent location history
2000Based in Kamifukuoka, JP· patent location history
2008Based in Kangawa, JP· patent location history
2012Patents assigned to KUWAHARA SOICHI (3)· patent assignee history
2012Patents assigned to TOMITA MANABU (3)· patent assignee history
2012Patents assigned to USHINOHAMA IWAO (3)· patent assignee history
2012Patents assigned to IKEMOTO YUICHIRO (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SONY CORP291997–2017
KUWAHARA SOICHI32012
TOMITA MANABUself32012
USHINOHAMA IWAO32012
IKEMOTO YUICHIRO22012
Locations
LocationPatentsSpan
Kanagawa, JP281997–2017
Kangawa, JP12008
Kamifukuoka, JP12000