Inventor
Nori Sasaki
Inventor
Hitachi, JP
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds22%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light11%
G01NInvestigating or analysing materials by determining their chemical or physical properties11%
G02BOptical elements, systems or apparatus11%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein11%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
G11BInformation storage based on relative movement between record carrier and transducer11%
Y10TTechnical subjects covered by former us classification11%
PatentTitleYear
7,973,125'Method of evaluating polymide dissolution rate, method of producing polymide, and polymide obtained using same methods'20117,642,018'Photosensitive resin composition, pattern forming method and electronic parts using the photosensitive resin composition'20105,837,804'Polyimides and optical parts obtained by using the same'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2011Patents assigned to HITACHI CHEMICAL CO LTD (2)· patent assignee history
1998–2011Based in Hitachi, JP· patent location history
2010Patents assigned to HITACHI CHEM DUPONT MICROSYS (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI CHEMICAL CO LTD | 2 | 1998–2011 |
| HITACHI CHEM DUPONT MICROSYS | 1 | 2010 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hitachi, JP | 3 | 1998–2011 |