Inventor

Norbert Wabra

Inventor

Werneck, DE

Overview

2008–2021

Patent span

Physics

Primary field (CPC G)

Patents· 43 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices47%

G02BOptical elements, systems or apparatus21%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%

G21KHandling of particles or ionising radiation not otherwise provided for8%

B82YSpecific uses or applications of nanostructures3%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%

G01NInvestigating or analysing materials by determining their chemical or physical properties1%

G06FElectric digital data processing1%

H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light1%

Y10TTechnical subjects covered by former us classification1%

PatentTitleYear

11,112,543Optical element having a coating for influencing heating radiation and optical arrangement2021 10,591,825Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography2020 10,474,036Optical element and optical arrangement therewith2019 10,401,540Optical element having a coating for influencing heating radiation and optical arrangement2019 10,345,710Microlithographic projection exposure apparatus and measuring device for a projection lens2019 10,303,063Projection exposure apparatus with at least one manipulator2019 10,261,425Projection exposure apparatus with a highly flexible manipulator2019 10,061,206Projection lens with wave front manipulator and related method and apparatus2018 10,048,592Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography2018 10,018,907Method of operating a microlithographic projection apparatus2018 10,001,631Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element2018 9,977,338Projection objective for a microlithographic projection exposure apparatus2018 9,964,859Lithography projection objective, and a method for correcting image defects of the same2018 9,939,730Optical assembly2018 9,910,364'Projection exposure apparatus including at least one mirror'2018 9,846,367Projection exposure apparatus with at least one manipulator2017 9,829,800System correction from long timescales2017 9,817,316'Projection exposure method and projection exposure apparatus for microlithography'2017 9,709,770'Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus'2017 9,606,446'Reflective optical element for EUV lithography and method of manufacturing a reflective optical element'2017 9,588,445'Projection objective for a microlithographic projection exposure apparatus'2017 9,470,872'Reflective optical element'2016 9,436,095'Exposure apparatus and measuring device for a projection lens'2016 9,372,411'Projection objective of a microlithographic projection exposure apparatus'2016 9,348,234'Microlithographic apparatus'2016 9,316,922'Lithography projection objective, and a method for correcting image defects of the same'2016 9,280,058'Projection objective for a microlithographic projection exposure apparatus'2016 9,235,143'Microlithographic projection exposure apparatus'2016 9,170,497'Projection exposure apparatus with at least one manipulator'2015 9,164,396'Projection lens system of a microlithographic projection exposure installation'2015 9,134,613'Illumination and displacement device for a projection exposure apparatus'2015 8,902,407'Projection objective for a microlithographic projection exposure apparatus'2014 8,879,159'Lithography projection objective, and a method for correcting image defects of the same'2014 8,659,744'Method for correcting a lithography projection objective, and such a projection objective'2014 8,330,935'Exposure apparatus and measuring device for a projection lens'2012 8,319,944'Projection lens system of a microlithographic projection exposure installation'2012 8,174,676'Method for correcting a lithography projection objective, and such a projection objective'2012 8,064,041'Projection objective for a microlithographic projection exposure apparatus'2011 8,054,557'Lithography projection objective, and a method for correcting image defects of the same'2011 7,782,440'Projection lens system of a microlithographic projection exposure installation'2010 7,719,658'Imaging system for a microlithographical projection light system'2010 7,692,868'Lithography projection objective, and a method for correcting image defects of the same'2010 7,463,423'Lithography projection objective, and a method for correcting image defects of the same'2008

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2008–2010Patents assigned to ZEISS CARL SMT AG (4)· patent assignee history

2008–2021Based in Werneck, DE· patent location history

2011–2021Patents assigned to ZEISS CARL SMT GMBH (39)· patent assignee history

2011–2016Patents assigned to WABRA NORBERT (8)· patent assignee history

2012–2014Patents assigned to GRUNER TORALF (4)· patent assignee history

2012–2016Patents assigned to BITTNER BORIS (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ZEISS CARL SMT GMBH	39	2011–2021
WABRA NORBERTself	8	2011–2016
GRUNER TORALF	4	2012–2014
ZEISS CARL SMT AG	4	2008–2010
BITTNER BORIS	3	2012–2016

Locations

Location	Patents	Span
Werneck, DE	43	2008–2021