Inventor
NICHOLAS WISWELL
Inventor
US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1028%
B24BMachines, devices, or processes for grinding or polishing17%
G06NComputing arrangements based on specific computational models17%
H01LSemiconductor devices17%
G01BMeasuring length, thickness or similar linear dimensions11%
G05BControl or regulating systems in general11%
PatentTitleYear
11,701,749Monitoring of vibrations during chemical mechanical polishing202311,660,722Polishing system with capacitive shear sensor202311,651,207Training spectrum generation for machine learning system for spectrographic monitoring202311,577,356Machine vision as input to a CMP process control algorithm202311,507,824Training spectrum generation for machine learning system for spectrographic monitoring2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2023Patents assigned to APPLIED MATERIALS INC (5)· patent assignee history
2022–2023Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 5 | 2022–2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 5 | 2022–2023 |