Inventor
Yoshiko Kokawa
Inventor
Hyogo, JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1056%
H10DInorganic electric semiconductor devices33%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests11%
PatentTitleYear
5,721,145'Method of making a semiconductor substrate having gettering effect'19985,419,786'Semiconductor substrate for bipolar element'19955,381,032'Semiconductor device having a gate electrode of polycrystal layer and a method of manufacturing thereof'19955,221,630'Method of manufacturing semiconductor device having a two layered structure gate electrode'19935,177,569'Semiconductor device having a two layered structure gate electrode'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–1998Patents assigned to MITSUBISHI ELECTRIC CORP (5)· patent assignee history
1993–1998Based in Hyogo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI ELECTRIC CORP | 5 | 1993–1998 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hyogo, JP | 5 | 1993–1998 |