Inventor
Yohsuke Inoue
Inventor
Ibaraki, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1040%
H10DInorganic electric semiconductor devices20%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1020%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%
PatentTitleYear
6,462,411'Semiconductor wafer processing apparatus for transferring a wafer mount'20026,283,273'Substrate processing apparatus'20015,736,753'Semiconductor device for improved power conversion having a hexagonal-system single-crystal silicon carbide'19985,233,216'Dielectric isolated substrate and process for producing the same'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–1998Patents assigned to HITACHI LTD (2)· patent assignee history
1993–2001Based in Ibaraki, JP· patent location history
1998Based in Tokai, JP· patent location history
2001–2002Patents assigned to KOKUSAI ELECTRIC CO LTD (2)· patent assignee history
2002Based in Hitachi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 2 | 1993–1998 |
| KOKUSAI ELECTRIC CO LTD | 2 | 2001–2002 |
Locations
| Location | Patents | Span |
|---|---|---|
| Ibaraki, JP | 2 | 1993–2001 |
| Hitachi, JP | 1 | 2002 |
| Tokai, JP | 1 | 1998 |