Inventor
Daniel Jozef Maria Direcks
Inventor
Simpelveld, NL
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices52%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them15%
Y10TTechnical subjects covered by former us classification15%
PatentTitleYear
10,268,127Lithographic apparatus and device manufacturing method20199,645,506'Lithographic apparatus and device manufacturing method'20179,618,835'Lithographic apparatus and a device manufacturing method involving an elongate liquid supply opening or an elongate region of relatively high pressure'20179,383,654'Fluid handling structure, lithographic apparatus and device manufacturing method'20168,681,308'Lithographic apparatus and device manufacturing method'20148,638,417'Fluid handling structure, lithographic apparatus and a device manufacturing method'20148,634,053'Lithographic apparatus and device manufacturing method'20148,472,003'Fluid handling structure, lithographic apparatus and device manufacturing method'20138,421,993'Fluid handling structure, lithographic apparatus and device manufacturing method'20138,405,815'Fluid handling structure, lithographic apparatus and device manufacturing method'20138,351,018'Fluid handling structure, lithographic apparatus and device manufacturing method'20138,345,218'Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method'20138,259,283'Immersion lithographic apparatus and device manufacturing method'20128,218,126'Lithographic apparatus and device manufacturing method'20127,561,250'Lithographic apparatus having parts with a coated film adhered thereto'2009Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2009–2019Patents assigned to ASML NETHERLANDS BV (15)· patent assignee history
2009–2014Based in Vaals, NL· patent location history
2012–2017Patents assigned to DIRECKS DANIEL JOZEF MARIA (12)· patent assignee history
2012–2016Patents assigned to PHILIPS DANNY MARIA HUBERTUS (7)· patent assignee history
2012–2014Patents assigned to STEFFENS KOEN (7)· patent assignee history
2012–2019Based in Simpelveld, NL· patent location history
2013–2014Patents assigned to BERKVENS PAUL PETRUS JOANNES (6)· patent assignee history
2017Based in Simpleveld, NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 15 | 2009–2019 |
| DIRECKS DANIEL JOZEF MARIAself | 12 | 2012–2017 |
| PHILIPS DANNY MARIA HUBERTUS | 7 | 2012–2016 |
| STEFFENS KOEN | 7 | 2012–2014 |
| BERKVENS PAUL PETRUS JOANNES | 6 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Simpelveld, NL | 12 | 2012–2019 |
| Vaals, NL | 2 | 2009–2014 |
| Simpleveld, NL | 1 | 2017 |