Inventor
Susumu Nishiura
Inventor
Toyama, JP
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
C23CCoating metallic material33%
G06FElectric digital data processing17%
PatentTitleYear
10,131,992Substrate processing apparatus, method of controlling substrate processing apparatus, method of maintaining substrate processing apparatus, and recording medium20189,690,879'Substrate processing apparatus, method of manufacturing semiconductor device, and method of generating recipe'20178,417,394'Substrate processing apparatus, semiconductor device manufacturing method and temperature controlling method'2013Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2013–2018Patents assigned to HITACHI INT ELECTRIC INC (3)· patent assignee history
2013Patents assigned to AOYAMA MASAO (1)· patent assignee history
2013Patents assigned to FUJIMOTO KENICHI (1)· patent assignee history
2013Patents assigned to IIDA TSUKASA (1)· patent assignee history
2013Patents assigned to MITSUI HIROYUKI (1)· patent assignee history
2013–2018Based in Toyama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI INT ELECTRIC INC | 3 | 2013–2018 |
| AOYAMA MASAO | 1 | 2013 |
| FUJIMOTO KENICHI | 1 | 2013 |
| IIDA TSUKASA | 1 | 2013 |
| MITSUI HIROYUKI | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyama, JP | 3 | 2013–2018 |